http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
Jeong, Byeong Guk,Park, Young-Shin,Chang, Jun Hyuk,Cho, Ikjun,Kim, Jai Kyeong,Kim, Heesuk,Char, Kookheon,Cho, Jinhan,Klimov, Victor I.,Park, Philip,Lee, Doh C.,Bae, Wan Ki American Chemical Society 2016 ACS NANO Vol.10 No.10
<P>Thick inorganic shells endow colloidal nanocrystals (NCs) with enhanced photochemical stability and suppression of photoluminescence intermittency (also known as blinking). However, the progress of using thick-shell 100 90 heterostructure NCs in applications has been limited due to the low photoluminescence quantum yield (PL QY <= 60%) at room temperature. Here, we demonstrate thick-shell NCs with CdS/CdSe/CdS seed/spherical quantum well/shell (SQW) geometry that exhibit near-unity PL QY at room temperature and suppression of blinking. In SQW NCs, the lattice mismatch is diminished between the emissive CdSe layer and the surrounding CdS layers as a result of coherent strain, which suppresses the formation of misfit defects and consequently permits, similar to 100% PL QY for SQW NCs with a thick CdS shell (>5 nm). High PL QY of thick-shell SQW NCs is preserved even in concentrated dispersion and in film under thermal stress, which makes them promising candidates for applications in solid-state concentrators.</P>
반도체 배선용 저 유전 물질에서의 구리 확산에 대한 전기적 신뢰성 평가
이희찬,주영창,노현욱,윤도영,이진규,차국헌,Lee Hee-Chan,Joo Young-Chang,Ro Hyun-Wook,Yoon Do-Young,Lee Jin-kyu,Char Kook-Heon 한국마이크로전자및패키징학회 2004 마이크로전자 및 패키징학회지 Vol.11 No.3
PMSSQ (Poly Methyl Silsesquioxane)-based matrix에 BTMSE (Bis Tri Methoxy Silyl Ethane) 를 첨가한 low-k물질의 전기적 특성을 조사하였다. 우리는 절연체로 copolymer를 사용하여 금속-절연체 -실리콘 구조를 만들고 BTS 실험을 통하여 누설 전류와 파괴 시간을 측정하였다. 코 폴리머의 기공이 $30\%$ 이상이 되었을 때, 파괴 시간이 급속하게 감소되어 진다. 온도에 관하여 파괴 시간으로부터 코 폴리머를 통한 구리 확산의 활성화 에너지는 1.51eV가 측정되었다. We investigated the electrical properties of copolymer low-k materials that are compromised of the PMSSQ(Poly Methyl Silsesquioxane)-based matrix with the BTMSE (Bis Tri Methoxy Silyl Ethane) additives. We manufactured MIS-type test samples using the copolymer as the insulator and measured their leakage current and failure time by means of the BTS (bias-temperature-stress) test. The failure time was observed to decrease drastically when the porosity of the copolymer was increased over $30\%$. From the measurement of failure time with respect to temperature. the activation energy of Cu drift through the copolymer was calculated to be 1.51 eV.