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매쉬업 프레임워크를 이용한 화학실험실 안전관리 매쉬업 서비스 개발
이응기,김현우,주홍택 한국통신학회 2017 KNOM Review Vol.20 No.2
Recent data on careless accidents in laboratories show that they have various causes. Therefore, automated safety management services are needed to prevent accidents and reduce damage in chemical laboratories. However, developing automated safety management services has some problems. In this paper, to solve these problems, we developed Mash-up Service for Chemical Laboratory Safety Management using Mash-up Framework. We designed service scenario, architecture, and sequence diagram to develop Mash-up Service for Chemical Laboratory Safety Management. Based on these designs, this paper implemented the Mash-up Service using Mash-up Framework and a variety of external services. In order to validate this implementation, we applied the service scenario designed before, and confirmed whether the results are appropriate for each scenario. 최근 발생하는 화학실험실 내의 사고사례들을 살펴보면 다양한 원인으로 인해 안전사고가 발생한다. 이러한 화학실험실 내의 안전사고를 예방하고 피해를 줄이기 위해서는 자동화된 안전관리 서비스가 필요하다. 그러나 자동화된 안전관리 서비스를 구현하기 위해서는 몇 가지 문제가 해결되어야 한다. 본 논문에서는 이 문제들을 해결하기 위하여 매쉬업 프레임워크(Mash-up Framework)를 이용한 화학실험실 안전관리 매쉬업 서비스를 개발하였다. 본 논문은 화학실험실 안전관리 매쉬업 서비스를 개발하기 위하여 서비스 시나리오, 구성도, 시퀀스 다이어그램을 설계하였다. 본 논문은 이러한 설계를 바탕으로 매쉬업 프레임워크와 다양한 외부 서비스들을 이용하여 화학실험실 안전관리 매쉬업 서비스를 구현하였다. 그리고 이를 검증하기 위해 앞서 설계한 서비스 시나리오에 적용하여 각각의 시나리오에 따른 결과들을 확인하였다.
이응기,Lee, Eung-Ki 한국반도체디스플레이기술학회 2010 반도체디스플레이기술학회지 Vol.9 No.1
Currently miniaturized electron-optical columns find their way into electron beam lithography systems. For better lithography process, it is required to make smaller spot size and longer working distance. But, the micro-columns of the multi-beam lithography system suffer from chromatic and spherical aberration, even when the electron beam is exactly on the symmetric axis of the micro-column. The off-axis error of the electron emitting source is expected to become worse with increasing off-axis distance of the focusing spot. Especially the electron beams far from the system optical axis have a non-negligible asymmetric intensity distribution in the micro-column. In this paper, the effect of the off-axis e-beam source is analyzed. To analyze this effect is to introduce a micro-column model of which the e-beam emitting source is aligned with the center of the electron beam by shifting them perpendicular to the system optical axis. The presented solution can be used to analysis the performance of the multi-electron-beam system. The performance parameters, such as the working distances and the focusing position are obtained by the computational simulations as a function of the off-axis distance of the emitting source.
다중빔 리소그래피를 위한 초소형 컬럼의 전자빔 광학 해석에 관한 연구
이응기,Lee, Eung-Ki 한국반도체디스플레이기술학회 2009 반도체디스플레이기술학회지 Vol.8 No.4
The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.
유기EL 디스플레이의 진공 성막 공정의 최적화에 관한 연구
이응기,Lee, Eung-Ki 한국반도체디스플레이기술학회 2008 반도체디스플레이기술학회지 Vol.7 No.1
In OLED vacuum evaporation process, the essential requirements include good uniformity of the film thickness over a glass substrate. And, it is commercially significant to improve the consuming efficiency of material of the evaporant which is deposited on the substrate because of high price of organic materials. In this paper, to achieve the better thickness uniformity and the better organic material consuming rate, a process optimization algorithm was developed by understanding vacuum evaporation process parameters that affect the material consuming efficiency and the uniformity of film thickness. Based on the method developed in this study, the vacuum evaporation process of OLED was successfully controlled. The developed method allowed the manufacture of high quality OLED displays with cheaper fabrication cost.
이응기 국립7개대학공동논문집간행위원회 2005 공업기술연구 Vol.5 No.-
In order to minimise the fluctuation of cutting load and the possibility of chipping on the cutedge in HSC, a continuous tool-path is developed with the minimum number of cutter retractions during the cutting operations. The method provides an intuitive model for topological warping a continuous tool-path onto a sculptured surface being machined. This algorithm begins with conforming the boundary curve of a mesh surface to that of the free-formed surface. Then, the continuous path is generated as a kind of the diagonal curve between the mesh curves such that the scallop height maintains a constant roughness to ensure higher levels of efficiency and quality in high-speed finish machining. It allows the sculptured surface incorporating both steeper and flatter areas to be high-speed machined.