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다층박막 Fe(50 Å) / [Co(17 Å) / Cu(24 Å)]20의 증착률 및 열처리가 자기저항에 미치는 효과
김미양(M. Y. Kim),최수정(S. J. Choi),최규리(K. L. Choi),송은영(E. Y. Shong),오미영(M. Y. Oh),이장로(J. R. Rhee),이상석(S. S. Lee),황도근(D. G. Hwang),박창만(C. M. Park),이기암(K. A. Lee) 한국자기학회 1998 韓國磁氣學會誌 Vol.8 No.5
Dependence of magnetoresistance on base pressure and deposition rates of each Fe, Co, Cu layers in the Fe(50 Å)/[Co(17 Å)/Cu(24 Å)_(20) multilayer thin films, prepared by dc magnetron sputtering on Corning glass, were investigated. AFM analysis, X-ray diffraction analysis, vibrating sample magnetometer analysis, and magnetoresistance measurement (4-probe method) were performed. The multilayer films deposited under low base pressure increases magnetoresistance ratio by preventing oxidation. Annealing for the samples at a moderate temperature allowed larger textured grain with no loss in the periodicity. Magnetoresistance ratio of the annealed multilayers was increased due to the increase antiferromagnetically coupled fraction of the film after annealing. Optimization of deposition rate was greater than 1 Å/s for Fe, and 2.8 Å/s for Cu. Deposition rate of Co showed a tendency of increasing of magnetoresistance ratio due to the formation of flat magnetic layer in case of high deposition rate of Co.