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김영환,김종수,박세윤,조형호,김성규 대한금속재료학회(대한금속학회) 1993 대한금속·재료학회지 Vol.31 No.12
Amorphous Al_(88)Ni_(10-x)Co_xY₂(x=1, 3) alloys were examined for their devitrification characteristics at temperatures above precipitation onset temperature(T_(xl)) of Al phase. The particle size of Al phase increases in the range of 5 to 15㎚ with increasing aging temperatures. With an increase of precipitation amount(V_f) of fcc-Al phase, the thermal stability of remained amorphous phase was significantly enhanced. These devitrified amorphous alloys at V_f=14% exhibit tensile fracture strength(σ_f) and hardness(H_v) which are about 30% higher than those of amorphous single phase alloys with the same composition, without detriment to good bending ductility (e.g., 1360MPa at 14%V_f for Al_(88)Y₂Ni_9Co₁alloy). The σ_f and fracture elongation (ε_f) in the devitrified amorphous alloys decreases with increasing Co content. This compositional effect is presumably due to an increase in embrittlement tendency caused by stronger tendency of structural relaxation in the amorphous phase with increasing Co content.
김영환,조형호,김성규 대한금속재료학회(대한금속학회) 1993 대한금속·재료학회지 Vol.31 No.12
Microstructure and magnetic properties of CoCrPt/Cr thin films were investigated as a function of sputtering condition during the deposition of CoCrPt thin films. Strong separation of Co grains was observed with increasing argon sputtering pressure due to the enhanced scattering of argon ions with sputtering particles, thereby resulting in the reduced exchange coupling and also the increased coercivity by a factor of four. Plane and cross sectional TEM indicated that most Co grains sputtered at high pressure were separated by 10-20Å thick boundary and share their growth on bigger Cr grains. The Co grain separation decreased with the application of substrate bias and disappeared by -200V bias. The bias sputtered CoCrPt thin films decreased their grain size and increased epitaxial growth on Cr layer and also (101 ̄0) texture. The slight decrease in squareness of bias sputtered films resulted from the residual stress in the films. The required magnetic field to saturate the film significantly increased with increasing substrate bias.