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이영훈,Lee Y. H. 한국가금학회 2005 韓國家禽學會誌 Vol.32 No.2
Mast cells have been studied extensively in various animals including rats and mice, whereas little is known the morphological data about pheasant mast cells. Here, morphological features of Korean pheasant mast cells are described in this study using light and electron microscopes. For light microscopy, mast cells had many metachromatic granules stained with toluidine blue in the cytoplasm. The fixation with $10\%$ neutral buffered formalin blocked staining of most mast cells but a modified Karnovsky solution proved to be a good fixative. In Korean pheasants, toluidine blue stained more mast cells than did alcian blue. For electron microscopy, the mast cells of the Korean pheasant were round, oval, spindle-like and irregular form and occasionally had a few short cytoplasmic processes. These cells had membrane-bounded granules and poorly developed organells. Some granules in the cytoplasm of the mast cells had bilayer membrane. Most granules were round shape and the membrane of several granules was concave or convex. The granules were composed of three parts, homogenous, particulate and reticular pattern. 꿩 비만세포는 원형, 난원형, 방추형 또는 부정형이었고 세포질돌기를 가지고 있었다. 꿩 비만세포는 Karnovsky 용액으로 고정했을 때 가장 좋은 염색성을 얻었고, Toluidine blue로 염색을 했을 때 비만세포의 과립은 이염색성(meta-chromatic)을 나타내었다. 비만세포의 세포질에는 막으로 둘러싸인 과립과 발달이 미약한 세포소기관으로 채워져 있었다. 비만세포의 과립은 원형과 난원형이었고 일부 과립은 막이 함몰된 오목한 모양과 밖으로 돌출된 볼록한 모양이었다. 과립 속의 구조는 동질성, 입자형 또는 망상형이었다.
Rf 마그네트론 스퍼터링으로 제조된 퍼멀로이 박막의 자기이방성 조절을 위한 NdFeB 영구자석의 영향 및 자기특성 해석
이영훈(Y. H. Lee),김기현(K. H. Kim),김종렬(J. Kim) 한국자기학회 2002 韓國磁氣學會誌 Vol.12 No.2
Permalloy thin films fabricated by rf magnetron sputtering showed the excellent magnetic properties, i.e., an effective permeability of over 2000 at 1 ㎛ thick up to 10 ㎒, a saturation magnetization of 10~12 kG, a coercive force of 0.2~1 Oe, resistivity (ρ) is 20 μΩ㎝. In order to control the magnetic anisotropy direction of the films in a wafer scale, two parallel Nd-Fe-B permenant mangnets were used to provide the magnetic field during the sputtering process. As a result, the anisotropy direction was successfully controlled when the two magnets were seperated with a distance of 70 ㎜. 3D simmulation of the magnteic fields around the wafer during sputtering were in accord with the above result.