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안강호,배귀남,Ahn, K.H.,Bae, G.N. 대한설비공학회 1994 설비공학 논문집 Vol.6 No.4
Filter media performance was evaluated using monodisperse NaCl particles with Differential Mobility Analyzer and Ultrafine Condensation Particle Counter. Low or medium performance filters show that the most penetrating particles size(MPPS) is around $0.3{\mu}m$ in diameter and is shifted to smaller sizes as the filter face velocity increases. However, HEPA and ULPA filters show MPPS is around $0.15{\mu}m$ in diameter and is also shifted to $0.1{\mu}m$ in diameter as the face velocity increases. In case of electret filter, the MPPS is found around $0.04{\mu}m$ region for Boltzmann charge equilibrium particles. There is a tendency of strong collection efficiency decrease for large particles as the face velocity increases on the contrary to the other filters. One of the medium performance filter efficiency was compared with filtration theory and the good agreetment was found in the experimental range.
in - line XPS와 AFM을 이용한 유기물의 UV / ozone 건식세정과정 연구
이경우(K. W. Lee),황병철(B. C. Hwang),손동수(D. S. Son),천희곤(H. G. Chun),김경중(K. J. Kim),문대원(D. W. Moon),안강호(K. H. Ahn) 한국진공학회(ASCT) 1995 Applied Science and Convergence Technology Vol.4 No.3
본 실험에서는 실리콘 웨이퍼 위에 photoresist(PR)와 octadecyltrichlorosilane(OTS, CH₃(CH₂)_l7SiCl₃)를 입혀서 UV/ozone 처리를 하였을 때 어떻게 유기물질들이 UV/ozone과 반응하여, 어떻게 표면에서 제거되는지를 in-line으로 연결된 XPS로 분석하고 반응시킨 표면들의 거칠기(roughness)를 AFM을 이용하여 관찰하였다. 실험결과 상온에서 UV/ozone 처리를 했을 경우, PR과 OTS같은 유기물질이 표면에서 산화되는 것을 알 수 있었으나 이들이 제거되지 않고 표면에 그대로 남아있음을 알 수 있었다. 그러나 가열하면서(PR : 250℃, ORS : 100℃) UV/ozone 처리를 하였을 경우 표면에서 산화됨과 동시에 이들 산화물들이 표면에서 제거됨을 알 수 있었다. XPS 분석으로부터 이들의 산화 반응물은 PR과 OTS 모두 -CH₂- , -CH₂O- , =C=O, -COO-를 가지는 것으로 나타났으며, 열에너지에 의해서 이들이 표면에서 제거되는 것으로 나타났다. AFM 분석결과는 상온에서 UV/ozone 처리를 하였을 경우에 표면의 거칠기가 적은 반면, 가열하면서 UV/ozone 처리를 하였을 경우에는 표면의 거칠기가 다소 증가하였다. In this work, photoresist (PR) and octadecyltrichlorosilane (OTS, CH₃(CH₂)_17SiCl₃) on Si were removed by the UV/ozone cleaning method and the surfaces were analyzed byin-line XPS to study mechanisms how the organic films react with UV/ozone and removed from the surface. The surface topographic changes were also observed by AFM. UV/ozone treatments of PR and OTS films at room temperature resulted in the oxidation of the organic surface contaminants, which remained on the surface of the silicon substrates at room temperature. The PR and OTS were oxidized and desorbed very rapidly by UV/ozone treatment at 100℃ and 200~250℃, respectively. From the XPS analyses, it was found that PR and OTS were oxidized to compounds having -CH₂-, -CH₂O-, =C=O, -COO- and desorbed from the surface upon heating. Thd AFM results showed that the UV/ozone treatments of PR and OTS at room temperature did not increase the surface roughness, but the surface roughness was increased at the higher temperature(PR : 250℃, OTS : 100℃).
박명식,이재헌,안강호,김정호,Park, M.S.,Lee, Jae-Heon,Ahn, K.H.,Kim, J.H. 대한설비공학회 1993 설비공학 논문집 Vol.5 No.1
A numerical investigation has been carried out for the two-dimensional flow and pressure characteristics in a clean room equipped with two kinds of filters and four access panels. The distributed pressure resistance concept was applied to describe the momentum loss in filters and access panels. As a result, the velocity profile in the clean room became rather smooth by the presence of access panels. Furthermore, the average pressure drop of each access panel reached the same value so that the ratio of the flow rate should be the same at any zone. The closing of an access panel with maintaining the other access panels being opened had influenced on the velocity distribution in lower two thirds of left half space of the clean room.
배귀남,이춘식,박승오,안강호,Bae, G.N.,Lee, C.S.,Park, S.O.,Ahn, K.H. 대한설비공학회 1995 설비공학 논문집 Vol.7 No.3
The average particle deposition velocity toward a vertical wafer surface in a vertical airflow chamber was measured by a wafer surface scanner(PMS Model SAS-3600). Polystyrene latex(PSL) spheres with diameters between 0.3 and $0.8{\mu}m$ were used. To examine the effect of the airflow velocity on the deposition velocity, experiments were conducted for three vertical airflow velocities ; 20, 30, 50cm/s. Experimental data of particle deposition velocity were compared with those given by prediction model suggested by Liu and Ahn(1987).
최광열(G. Y. Choi),윤진욱(J. U. Yoon),안강호(K. H. Ahn) 대한기계학회 2002 대한기계학회 춘추학술대회 Vol.2002 No.5
Agglomerated and nonagglomerated SiO₂ particles are synthesized in furnace by the vapor feeding method<br/> for the test particle generator this study. These polydispersed particles are classified with DMA to extract<br/> equal mobility particles. Then these particles are introduced into Thermal Precipitator through the<br/> ESP(Electrostatic Precipitator) to see the thermophoretic particle deposition using CNCs(Condensation Nuclei<br/> Counter). The efficiency of thermophoretic particle deposition according to agglomerated and nonagglomerated<br/> particles in Thermal precipitator has been studied as a function of particle size and TEOS mole<br/> concentration using monodisperse particles classified by DMA. The results show that the particle deposition<br/> efficiency decreases as TEOS mole concentration increases and particle size increases. Therefore, it is<br/> concluded that the thermophoretic deposition efficiency is dependent of the particle morphology.