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김기돈(Ki Don Kim),양동열(Dong Yol Yang),정준호(Jun Ho Jeong) 대한기계학회 2003 대한기계학회 춘추학술대회 Vol.2003 No.11
The analysis involves an adaptive grid that is created under a criterion of element categorization of filling<br/> states and locations in the total region at each time step. By using an adaptive grid wherein the elements, finer<br/> than those in internal and external regions, are distributed at the surface region through refinement and<br/> coarsening procedures, a more efficient analysis of transient fluid flow with free surface is achieved. Using<br/> the proposed numerical technique, the collapse of a dam is analyzed. The numerical results agree well with<br/> the theoretical solutions as well as with the experimental results. Through comparisons with the numerical<br/> results of several cases using different types of grids, the efficiency of the proposed technique is verified.
김기돈(Ki-don Kim),신요셉(Yosep Shin),이기중(Kijoong Lee),이지혜(Jihye Lee),최대근(Dae-geun Choi),최준혁(Junhyuk Choi),정준호(Jun-ho Jeong),이응숙(Eung-sug Lee) 대한기계학회 2010 대한기계학회 춘추학술대회 Vol.2010 No.11
We proposed stitch nanoimprint lithography combined with reverse-tone nanoimprint lithography to fabricate a large area nano-structured stamp. The stitch nanoimprint lithography has been a promising alternative to expensive conventional lithography methods such as e-beam lithography and KrF stepper. In this study reverse tone imprint lithography was performed to obtain opposite nano-structured patterns. Silicone(20wt%) contained polymer was coated on imprinted nanopatterns. This layer was used for the etch barrier of a Si wafer. We fabricated 250㎚ line and space grating patterns on 50×50㎟ area. Stitch accuracy of a grating pattern was smaller than 5um, which was undetectable by the naked eye.
〈학술논문〉 또는 〈응용논문〉 : 나노임프린트공정을 이용한 나노스케일 복합 패턴 형성 및 태양전지 응용
이기중(Ki-Jung Lee),최대근(Dae-Geun Choi),정준호(Jun-Ho Jeong),김기돈(Ki-Don Kim),최준혁(Jun-Hyuk Choi),이지혜(Jihye Lee),이순원(Soon-Won Lee),박성제(Seong-Je Park),김사라(Sarah Kim),이응숙(Eungsug Lee) 대한기계학회 2010 대한기계학회 춘추학술대회 Vol.2010 No.11
본 연구에서는 임프린트 공정에 의해서 제작된 몰드를 이용하여 마이크로-나노의 다양한 패턴 제작 방법과 이를 이용한 마이크로-나노 스케일 복합 패턴 제작기술에 관한 연구 결과 및 태양전지 소자 응용 결과를 소개하고자 한다. 첫 번째로, 마이크로 패턴위에 나노패턴을 제작하여 접촉각 변화를 측정하여 마이크로 구조물위 나노 패턴이 주는 기판 표면 특성변화를 관찰하였다. 두번째로, 기판위 나노 패턴의 선택적 전이를 위한 변수에 대한 분석 실험, 세번째로 패턴 전사 공정의 태양전지 및 전자소자 응용 가능성 실험을 계획 중이다. In this work, we report a fabrication method of complex pattern of micro-nano scale by using nano imprint lithography(NIL) and the solar device application. Micro-patterns were firstly fabricated and then nano patterns were formatted on the micro-patterns. The change of surface property was investigated. Secondly, the variables for selective pattern transfer were studied. Finally, solar cell and electronic device application is planning for future experiment.