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양극산화된 알루미늄과 마이크로 인덴테이션을 이용한 3 차원 마이크로-나노 하이브리드 패턴 제작
권종태(Jong Tae Kwon),신홍규(Hong Gue Shin),서영호(Young Ho Seo),김병희(Byeong Hee Kim) 대한기계학회 2007 大韓機械學會論文集A Vol.31 No.12
A simple method for the fabrication of 3D micro-nano hybrid patterns was presented. In conventional fabrication methods of the micro-nano hybrid patterns, micro-patterns were firstly fabricated and then nanopatterns were formatted on the micro-patterns. Moreover, these micro-nano hybrid patterns could be fabricated on the flat substrate. In this paper, we suggested the fabrication method of 3D micro-nano hybrid patterns using micro-indentation on the anodized aluminum substrate. Since diameter of the hemispherical nano-pattern can be controlled by electrolyte and applied voltage in the anodizing process, we can easily fabricated nano-patterns of diameter of 10㎚ to 300㎚. Nano-patterns were firstly formatted on the aluminum substrate, and then micro-patterns were fabricated by deforming the nano-patterned aluminum substrate. Hemispherical nano-patterns of diameter of 150㎚ were fabricated by anodizing process, and then micro-pyramid patterns of the side-length of 50㎛ were formatted on the nano-patterns using microindentation. Finally we successfully replicated 3D micro-nano hybrid patterns by hot-embossing process. 3D micro-nano hybrid patterns can be applied to nano-photonic device and nano-biochip application.
펨토초 레이저와 양극산화공정을 이용한 3차원 마이크로-나노하이브리드 패턴 제작
신홍규,권종태,서영호,김병희,정세채 한국공작기계학회 2007 한국공작기계학회 추계학술대회논문집 Vol.2007 No.-
We developed a simple and cost-effective method of fabrication 3D micro-nano hybrid patterns. In the conventional fabrication methods of the micro-nano hybrid patterns, micro-patterns are fabricated firstly on a substrate, and then nano-patterns are formed on the micro-patterns using e-beam, hologram and nano-probe lithography. However, this methods were limited only to 2 dimensional patterns. In order to improve this dimensional limitation and process time, femtosecond laser and AAO process were used. Femtosecond laser with ultra-fast pulse speed and low thermal damage can be modified effectively a metal surface into another material. Also, AAO process can be easily fabricated nano patterns on Al surface. In this study, using the femtosecond laser as a tool of surface modification of Al thin film, several miro patterns with an amorphous layer on the Al thin film were fabricated with respect to laser intensity and scanning speed. Sequently, micro-nano hybrid patterns were fabricated by using a simple AAO process. Finally, we verified the validity of micro-nano hybrid patterns through SEM and EDS.
양극산화공정 시 온도계수 변화에 따른 포어 생성의 영향
신홍규,권종태,서영호,김병희 한국공작기계학회 2008 한국공작기계학회 추계학술대회논문집 Vol.2008 No.-
In this paper, we present the affection of pore generation with respect to variation of temperature in the anodic aluminum oxidation(AAO) process. In conventional AAO methods for aluminum bulk sheet over 25mm, mild anodizing method with low anodizing voltage at 4oC temperature has usually been used. However, it is required to have a long processing time for mass production. In this paper, we suggested the hard anodizing method by low temperature for aluminum thin film of 1mm. Through various AAO experiments with respect to the variation of temperature, pore diameter and inter-pore(between pore and pore) distance at large area can be determined. In order to analysis the pore generation, FE-SEM was measured. Pore diameter and inter-pore distance are about 200nm and 250nm. Finally, concave nano-structures with various diameters can be successfully obtained after etching process to remove selectively AAO layer.
양극산화공정 시 온도계수 변화에 따른 포어 생성의 영향
신홍규(H. Shin),권종태(J. Kwon),서영호(Y. Seo),김병희(B. Kim) 한국생산제조학회 2008 한국생산제조시스템학회 학술발표대회 논문집 Vol.2008 No.10
In this paper, we present the affection of pore generation with respect to variation of temperature in the anodic aluminum oxidation(AAO) process. In conventional AAO methods for aluminum bulk sheet over 25㎜, mild anodizing method with low anodizing voltage at 40C temperature has usually been used. However, it is required to have a long processing time for mass production. In this paper, we suggested the hard anodizing method by low temperature for aluminum thin film of 1㎜. Through various AAO experiments with respect to the variation of temperature, pore diameter and inter-pore(between pore and pore) distance at large area can be determined. In order to analysis the pore generation, FE-SEM was measured. Pore diameter and inter-pore distance are about 200㎚ and 250㎚. Finally, concave nano-structures with various diameters can be successfully obtained after etching process to remove selectively AAO layer.
저온 양극산화공정을 이용한 반사 방지용 폴리머 마스터 제작
신홍규(Honggue Shin),권종태(Jongtae Kwon),서영호(Youngho Seo),김병희(Byeonghee Kim),박창민(Changmin Park),이재숙(Jaesuk Lee) 대한기계학회 2008 대한기계학회 춘추학술대회 Vol.2008 No.11
A simple method for the fabrication of porous nano-master for antireflective surface is presented. In conventional fabrication methods for antireflective surface, coating method with low refractive index has usually been used. However, it is required to have high cost and long times for mass production. In this paper, we suggested the fabrication method of antireflective surface by the hot embossing process using the porous nano patterned master on silicon wafer fabricated by low-temperature anodic aluminum oxidation. Through multi-AAO and etching processes, nano patterned master with high aspect ratio was fabricated at the large area. Pore diameter and inter-pore distance are about 150㎚ and from 150 to 200㎚. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.