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Exponentially Weighted Moving Average for High-Yield Processes Chart for High-Yield Processes
Takayuki Kotani,Etsuko Kusukawa,Hiroshi Ohta 대한산업공학회 2005 Industrial Engineeering & Management Systems Vol.4 No.1
Borror et al. discussed the EWMA(Exponentially Weighted Moving Average) chart to monitor thecount of defects which follows the Poisson distribution, refered to the EWMAc chart, as an alternative Shewhart c chart. In the EWMAc Run Length). On the other hand, in order to monitor the process fraction defectives P in high-yield proceses, Xie et al. presented the CCC(Cumulative Count of Conforming)-r chart of which quality characteristic is the cumulative count of conforming item inspected until observing r(≥2) nonconforming items. Furthermore, Ohta and Kusukawa presented the CS(Confirmation Sample)CCC-r chart as an alternative of the CCC-r chart. As a more superior chart in high-yield processes, in this paper we present an EWMACCC-r chart to detect more sensitively small or moderate shifts in P than the CSCCC-r chart. The proposed EWMACCC-r chart can be constructed by applying the designing method of the EWMAc chart to the CCC-r chart. ANOS(Average Number of CCC-r chart through computer simulation. It is demonstrated from numerical examples that the performance of proposed chart is more superior to the CSCCC-r chart.
Exponentially Weighted Moving Average Chart for High-Yield Processes
Kotani, Takayuki,Kusukawa, Etsuko,Ohta, Hiroshi Korean Institute of Industrial Engineers 2005 Industrial Engineeering & Management Systems Vol.4 No.1
Borror et al. discussed the EWMA(Exponentially Weighted Moving Average) chart to monitor the count of defects which follows the Poisson distribution, referred to the $EWMA_c$ chart, as an alternative Shewhart c chart. In the $EWMA_c$ chart, the Markov chain approach is used to calculate the ARL (Average Run Length). On the other hand, in order to monitor the process fraction defectives P in high-yield processes, Xie et al. presented the CCC(Cumulative Count of Conforming)-r chart of which quality characteristic is the cumulative count of conforming item inspected until observing $r({\geq}2)$ nonconforming items. Furthermore, Ohta and Kusukawa presented the $CS(Confirmation Sample)_{CCC-r}$ chart as an alternative of the CCC-r chart. As a more superior chart in high-yield processes, in this paper we present an $EWMA_{CCC-r}$ chart to detect more sensitively small or moderate shifts in P than the $CS_{CCC-r}$ chart. The proposed $EWMA_{CCC-r}$ chart can be constructed by applying the designing method of the $EWMA_C$ chart to the CCC-r chart. ANOS(Average Number of Observations to Signal) of the proposed chart is compared with that of the $CS_{CCC-r}$ chart through computer simulation. It is demonstrated from numerical examples that the performance of proposed chart is more superior to the $CS_{CCC-r}$ chart.
A Synthetic Exponentially Weighted Movingaverage Chart for High-yield Processes
Etsuko Kusukawa,Takayuki Kotani,Hiroshi Ohta 대한산업공학회 2008 Industrial Engineeering & Management Systems Vol.7 No.2
As charts to monitor the process fraction defectives, P, in the high-yield processes, Mishima et al. (2002) discussed a synthetic chart, the Synthetic CS chart, which integrates the CS (Confirmation Sample) CCC(Cumulative Count of Conforming)-r chart and the CCC-r chart. The Synthetic CS chart is designed to monitor quality characteristics in real-time. Recently, Kotani et al. (2005) presented the EWMA (Exponentially Weighted Moving-Average)CCC-r chart, which considers combining the quality characteristics monitored in the past with one monitored in real-time. In this paper, we present an alternative chart that is more superior to the EWMACCC-r chart. It is an integration of the EWMACCC-r chart and the CCC-r chart. In using the proposed chart, the quality characteristic is initially judged as either the in-control state or the out-of-control state, using the lower and upper control limits of the EWMACCC-r chart. If the process is not judged as the in-control state by the EWMACCC-r chart, the process is successively judged, using the CCC-r chart to confirm the judgement of the EWMACCC-r chart. We compare the ANOS (Average Number of Observations to Signal) of the proposed chart with those of the EWMACCC-r chart and the Synthetic CS chart. From the numerical experiments, with the small size of inspection items, the proposed chart is the most sensitive to detect especially the small shifts in P among other charts.
Masafumi Ito,Takayuki Ohta,Masaru Hori 한국물리학회 2012 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.60 No.6
Recently, many kinds of non-equilibrium atmospheric-pressure plasma sources have been developed for medical and agricultural applications. Some sources have been applied to agricultural crops and foods for the inactivation of microorganisms and the acceleration of seed germination and crop growth. In this article, the applications of plasmas to disinfection of agricultural crops and foods are reviewed. Then, a high-density non-equilibrium atmospheric pressure plasma (NEAPP) applied for inactivating fungal spores of Penicillium digitatum, a difficult-to-inactivate food spoilage microorganism, is introduced as an environmentally safe and rapid inactivation method. The NEAPP employing Ar gas has a high electron density on the order of 1015 cm−3. The spores were successfully inactivated with a decimal reduction time in spores (D value) of 1.7 min. The contributions of ozone and UV radiation to the inactivation of the spores were evaluated and concluded not to be dominant. Therefore, the significance of neutral reactive species is suggested in the rapid inactivation using NEAPP.
A Synthetic Exponentially Weighted Moving-average Chart for High-yield Processes
Kusukawa, Etsuko,Kotani, Takayuki,Ohta, Hiroshi Korean Institute of Industrial Engineers 2008 Industrial Engineeering & Management Systems Vol.7 No.2
As charts to monitor the process fraction defectives, P, in the high-yield processes, Mishima et al. (2002) discussed a synthetic chart, the Synthetic CS chart, which integrates the CS (Confirmation Sample)$_{CCC(\text{Cumulative Count of Conforming})-r}$ chart and the CCC-r chart. The Synthetic CS chart is designed to monitor quality characteristics in real-time. Recently, Kotani et al. (2005) presented the EWMA (Exponentially Weighted Moving-Average)$_{CCC-r}$ chart, which considers combining the quality characteristics monitored in the past with one monitored in real-time. In this paper, we present an alternative chart that is more superior to the $EWMA_{CCC-r}$ chart. It is an integration of the $EWMA_{CCC-r}$ chart and the CCC-r chart. In using the proposed chart, the quality characteristic is initially judged as either the in-control state or the out-of-control state, using the lower and upper control limits of the $EWMA_{CCC-r}$ chart. If the process is not judged as the in-control state by the $EWMA_{CCC-r}$ chart, the process is successively judged, using the <CCC-r chart to confirm the judgement of the $EWMA_{CCC-r}$ chart. We compare the ANOS (Average Number of Observations to Signal) of the proposed chart with those of the $EWMA_{CCC-r}$ chart and the Synthetic CS chart. From the numerical experiments, with the small size of inspection items, the proposed chart is the most sensitive to detect especially the small shifts in P among other charts.
Keizo Kato,Kazuki Takahashi,Keisuke Suzuki,Takayuki Sato,Kazunari Shinbo,Futao Kaneko,Hidehiko Shimizu,Nozomu Tsuboi,Toyoyasu Tadokoro,Shinichi Ohta 한국물리학회 2005 Current Applied Physics Vol.5 No.4
Organic light emitting diodes (OLEDs) with nanostructured ultrathin layers inserted at the interface between electron- and hole-transport layers were investigated. The fundamental structure of the OLEDs fabricated by a vacuum evaporation method wasindium-tin-oxide (ITO) anode/copper phthalocyanine (CuPc)/N,N0-diphenyl-N,N0-bis(3-methylphenyl)-1,10-diphenyl-4,40-diamine(TPD)/8-hydroxyquinoline aluminum (Alq3)/LiF/Al cathode. Fullerene (C60) and rhodamine B (RhB) molecules were used as thenanosutructured ultrathin layers inserted at the interface between the Alq3 and TPD layers. The electroluminescent (EL) propertieshave been measured for the OLEDs with C60 and RhB ultrathin layers and the dependences on the thickness and the position of theinserted layers were examined. For the OLEDs with the C60 ultrathin layer, the improvements of the drive voltage and EL eciencywere observed. The OLED with the inserted C60 ultrathin lm of a monolayer thickness showed the highest eciency, which wastwice as large as that without C60 layer. On the contrary, the improvements were not observed for the OLEDs with the RhB ul-trathin layer..