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      • VLS-like growth and characterizations of dense ZnO nanorods grown by e-beam process

        Agarwal, D C,Chauhan, R S,Avasthi, D K,Sulania, I,Kabiraj, D,Thakur, P,Chae, K H,Chawla, Amit,Chandra, R,Ogale, S B,Pellegrini, G,Mazzoldi, P Institute of Physics [etc.] 2009 Journal of Physics. D, Applied Physics Vol.42 No.3

        <P>We present a new approach to produce ZnO nanorods in a reproducible manner at a temperature lower than other physical vapour deposition techniques, such as the vapour–liquid–solid mechanism. Arrays of well-aligned ZnO nanorods of uniform diameter have been synthesized on the Si substrate precoated with Au, using a simple electron beam evaporation method without the flow of any carrier gas. Scanning electron microscopy and atomic force microscopy characterizations show that as-grown nanorods are well aligned and uniform in diameter. X-ray diffraction measurements and clear lattice fringes in high-resolution transmission electron microscopy image show the growth of good quality polycrystalline hexagonal ZnO nanorods and a ⟨0 0 2⟩ growth direction. The polarization-dependent studies of near edge x-ray absorption fine structure (NEXAFS) are performed to investigate the electronic structure of the zinc and oxygen ions. The analysis of NEXAFS spectra at different angles of incidence of photon flux indicates the formation of ZnO nanorods having anisotropic behaviour of O and Zn states. The photoluminescence spectrum exhibits strong ultraviolet emission at 385 nm and the UV–visible spectrum also shows a band-gap transition around 390 nm indicating the good quality of nanorods. The catalytic growth mechanism of the ZnO nanorods is discussed on the basis of experimental results in this work.</P>

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        High-energy ion induced physical and surface modifications in antimony sulphide thin films

        S. Subramanian,M. Balaji,P. Chithra Lekha,K. Asokan,D. Kanjilal,Indra Sulania,Jai Prakash,D. Pathinettam Padiyan 한국물리학회 2010 Current Applied Physics Vol.10 No.4

        Sb2S3 thin films prepared by electrodeposition on indium tin oxide coated glass substrate were irradiated with 150 MeV Ni11+ ions for various fluence in the range of 1011–1013 ions/㎠. The modifications in the structure, surface morphology and optical properties have been studied as a function of ion fluence. X-ray diffraction (XRD) analysis indicates a shift in the (2 4 0) peak position towards lower diffraction angle and a decrease in grain size with increase in ion fluence. Presence of microcracks due to irradiation induced grain splitting effect has been observed from the SEM micrograph at higher ion fluence. The optical absorbance spectrum revealed a shift in the fundamental absorption edge and the band gap energy increased from a value of 1.63 eV for as-deposited films to 1.80 eV for the films irradiated with 1013 ions/㎠.

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