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Yifu Ke,Wenhua Huang,Santhosh Kumar Thatikonda,Ruqi Chen,Chuangye Yao,Ni Qin,Dinghua Bao 한국물리학회 2020 Current Applied Physics Vol.20 No.6
Excellent dielectric frequency, bias, and temperature stability of bismuth silicate (Bi2SiO5, BSO) thin films with a low dielectric loss has been obtained in this study. The thin films were prepared on Pt/Ti/SiO2/Si substrates by a chemical solution deposition method at a relatively low annealing temperature of 500 °C. The BSO films have a preferred growth along (200) orientation with dense fine-grained surface morphology. The dielectric constant and dielectric loss of the thin film annealed at 500 °C are 57 and 0.01, respectively, at 100 kHz, with little change between 1 kHz and 100 kHz and in the bias electric field range between−250 kV/cm and 250 kV/cm, indicating that the thin film exhibits a low dielectric loss as well as excellent frequency and bias field stability. The dielectric- temperature measurements confirmed that the BSO thin film annealed at 500 °C also has good temperature stability between 150 K and 450 K. Our results suggest that the BSO thin films have potential applications in the next-generation integrated capacitors.
Ruqi Chen,Wei Hu,Lilan Zou,Yifu Ke,Aize Hao,Dinghua Bao 한국물리학회 2019 Current Applied Physics Vol.19 No.9
Orthorhombic Bi2SiO5 thin films with dense surface were synthesized by using a chemical solution deposition method. The crystallized films were first utilized to implement resistive memory cells with Pt/Bi2SiO5/Pt sandwich architecture. It exhibited outstanding switching parameters including concentrated distributions of low and high resistance states, uniform switching voltages, cycling endurance, and long retention. Furthermore, the model of formation and rupture of conductive filaments consisted of oxygen vacancies was used to well explain resistive switching behavior. The results revealed that the solution-processed Bi2SiO5 thin film devices have great potential for forefront application in nonvolatile memory.
Thatikonda Santhosh Kumar,Huang Wenhua,Du Xingru,Yao Chuangye,Ke Yifu,Wu Jiang,Qin Ni,Bao Dinghua 한국물리학회 2021 Current Applied Physics Vol.24 No.-
The antiferroelectric (Pb0.985Sm0.01) (Zr1-xTix)O3 (Ti-PSZO) thin films were synthesized on Pt(111)/Ti/SiO2/Si substrates using a chemical solution deposition method. The films were crystallized in the perovskite phase with a preferential orientation along (111) direction. With Ti doping in PSZO, a gradual transformation from antiferroelectric to ferroelectric phase transition was noticed at room temperature owing to the Ti doping induced lattice distortion. The phase transition has been confirmed through the P - E hysteresis loops, X-ray diffraction (peak shifting), capacitance-voltage measurements, and Raman scattering analysis. The thin film with Ti = 0.15 doping displayed a ferroelectric behavior with high dielectric constant and large dielectric tunability of about 62%. Also, Ti doping altered the Curie temperature (Tc) and enhanced the order of dielectric diffuseness. It is believed that Ti-doping in PSZO is an effective way to induce an antiferroelectric - ferroelectric phase transition and to tailor the electrical characteristics of PSZO thin films.