http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
Soft X-ray sources with a narrow spectral bandwidth
I. W. Choi,H. Daido,M. Suzuki 한국물리학회 2003 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.42 No.III
Soft X-ray spectra emitted from the laser-plasma sources produced by focusing a nanosecond Nd:YAG laser pulse onto targets made of pure Sn and its oxides (SnO and SnO2) were investigated by means of a space-resolved technique for the soft X-ray emission areas. When using targets made of Sn oxides instead of pure Sn, especially SnO2 thin lm, much narrower spectral bandwidth of the characteristic transition array peaked near 13.5 nm wavelength has been achieved. The narrow spectral bandwidth feature with great suppression of soft X-ray emissions outside the bandwidth shows various applications, such as a source of the soft X-ray projection lithography system.
Characterization of an Intense Laser-Produced Preformed Plasma for Proton Generation
A Sagisaka,A. Noda,A. Fukumi,A. Yogo,A. S. Pirozhkov,H. Daido,K. Nemoto,K. Ogura,M. Nishiuchi,M. Mori,M. Kado,S. Orimo,S. Nakamura,T. Nayuki,T. Shirai,T. Fujii,Y. Oishi,Y. Hayashi,Y. Iwashita,Z. Li 한국물리학회 2007 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.51 No.I
High-energy protons are generated with a 3-μm-thick tantalum target irradiated with a highintensity laser under the preformed plasma condition. We observe the electron density distributions of preformed plasmas with two-color probe beams as interferometers. The preformed plasma at the front side of the target is generated by pre-pulses of a high-intensity Ti:sapphire laser. In this preformed plasma condition, the maximum proton enegy is 900 keV. The half angle of the generated proton beam (>500 keV) is about 10.
New decay scheme of theSb8551136<sup>6−</sup>isomer
Lozeva, R.,Odahara, A.,Moon, C.-B.,Nishimura, S.,Doornenbal, P.,Naï,dja, H.,Nowacki, F.,Sö,derströ,m, P.-A.,Sumikama, T.,Lorusso, G.,Wu, J.,Xu, Z. Y.,Baba, H.,Browne, F.,Daido, R.,Daugas, American Physical Society 2015 PHYSICAL REVIEW C - Vol.92 No.2