태양전지-지구 에너지원이자 우주항해의 시작

한일기,Han, Il Ki 한국진공학회 2014 진공 이야기 Vol.1 No.4

About 170 years has been passed since the concept of photovoltaic has been suggested by French physicist Alexandre-Edmond Becquerel. Now the highest efficiency of solar cell has reached up to 44% by III-V multi-junction solar cells with concentrator. Those multi-junction solar cells are suitable as energy source for spaceships. On the other hand, the cell efficiency of solar cell for electric power generation as energy source for Earth has is going to be saturated although commercial solar cell efficiency is around 20%. In the part 1 of this article, the history of III-V multi-junction solar cells which have been adapted for spaceships is explained and in the part 2, new approach for the improvement of cell efficiency is suggested as the energy source for Earth.

Reactive Ion Etching에 의한 ITO/반도체 및 ITO/BaTiO3 구조의 선택적 에칭 특성

한일기,이윤희,김회종,이석,오명환,이정일,김선호,강광남,박홍이,Han, Il-Ki,Lee, Yun-Hi,Kim, Hwe-Jong,Lee, Seok,Oh, Myung-Hwan,Lee, Jung-Il,Kim, Sun-Ho,Kang, Kwang-Nham,Park, Hong-Lee 대한전자공학회 1995 전자공학회논문지-A Vol.32 No.1

Eteching characteristics of the Indium Tin Oxide (ITO), which is transparent conductor, was investigated with CH4/H2 and Ar as etching gases for the Reactive Ion Etching (RIE). With CH4/H2 for the etching gas, the highly selective etching characteristics for the ITO on GaAs was obtained. It was examined that the dominant etching parameter for the selective etchning of ITO on GaAs structure was the chamber pressure. But, the etching selectivity for ITO on InP was poor eventhough we tried systematic etching. RIE etching conditins using CH4/H2 gas was limited due to the formation of polymer on the substrates. In the case of Ar gas for the reactive gas, the selectivity of ITO on BaTiO3 was above 10. The etch rete of ITO was more sensitive to the etching parameters than that of BaTiO3, which was almost constant with different etching parameters.

화학적 빔 에피탁시에 의한 평면구조에서의 InP/InGaAs 다층구조의 선택적 영역 에피 성장

한일기,이정일,Han, Il-Ki,Lee, Jung-Il 한국진공학회 2009 Applied Science and Convergence Technology Vol.18 No.6

Chemical beam epitaxy 성장법으로 InP/InGaAs 다층구조의 선택적 영역 에피성장 (selective area epitaxy)을 하였다. <011> 방향에 평행한 직선패턴에서는 선폭이 작아지고, <01-1> 방향에 평행한 직선패턴에서는 선폭이 증가하는 현상이 나타났는데 이는 InGaAs의 <311>A와 B면이 <01-1> 방향에 평행한 직선패턴에서 성장되었기 때문으로 설명되었다. 성장속도가 $1\;{\mu}m/h$인 조건에서 5족 가스의 압력이 감소할수록 (100) 면 위에서 평평한 에피층이 성장되었는데 이는 5족 가스의 과포화현상에 의한 3족 원소의 표면이동으로 설명하였다. Selective area epitaxy of multiple-stacked InP/InGaAs structures were grown by chemical beam epitaxy. The width of top of the multiple-stacked InP/InGaAs layer which were selectively grown on the stripe lines parallel to the <011> direction was narrowed, while the width of top of the multiple-stacked InP/InGaAs layer on the stripe lines parallel to the <01-1> was widen. This difference according to the <011> and <01-1> direction was explained by the growth of InGaAs <311>A and B faces on the (100) InP surface on the stripe lines parallel to the <01-1> direction. Under growth rate of $1\;{\mu}m/h$, top of the multiple-stacked InP/InGaAs was flattened as the pressure of group V gas was decreased. This phenomenon was understood by the saturation of group V element on the surface.

GaAs/AlGaAs Quantum Cascade Laser에서 Deep Mesa 구조에 의한 문턱전류 감소

한일기,송진동,이정일,Han, Il-Ki,Song, Jin-Dong,Lee, Jung-Il 한국진공학회 2008 Applied Science and Convergence Technology Vol.17 No.6

GaAs/AlGaAs based quantum cascade lasers were fabricated with two different types of i) the shallow mesa type which was etched up to above active region and ii) the deep mesa type which was etched through active region. While the threshold current density of shallow mesa type was $26-32\;kA/cm^2$, the one of deep mesa type was reduced drastically up to $13\;kA/cm^2$. Such lowered threshold current density at deep mesa type attributed to the reduction of current loss to the lateral directions. GaAs/AlGaAs 물질계를 기반으로 한 양자폭포레이저를 제작하였다. 양자폭포레이저는 활성층의 위까지만 식각된 shallow mesa 구조와 활성층까지 식각된 deep mesa 구조로 제작되었다. shallow mesa 구조의 경우 문턱전류 밀도가 $26-32\;kA/cm^2$이었지만 deep mesa 구조의 경우 문턱전류 밀도는 $13\;kA/cm^2$로 대단히 감소되었다. Deep mesa 구조에서의 문턱전류 감소는 측면 방향으로의 전류 손실이 감소되었기 때문으로 설명되었다.

대면적 레이저 다이오드의 필라멘테이션과 α-factor

한일기,허두창,이정일,이주인,Han, Il-Ki,Her, Du-Chang,Lee, Jung-Il,Lee, Joo-In 한국광학회 2002 한국광학회지 Vol.13 No.4

Linewidth enhancement factor ($\alpha{-factor}$) 값이 2와 4인 두 종류의 1.55${\mu}m$ 다층양자우물(Multi-Quantum Well; MQW) 대면적 레이저 다이오드를 제작하였다. 제작된 레이저 다이오드의 far-field 측정 결과 $\alpha{-factor}$ 값이 4일 때 보다 2인 구조에서 반폭치(Full Width at Half Maximum; FWHM)와 필라멘테이션(filamentation)이 감소되었다. 주입전류의 증가에 따라 두 종류 모두 far-field의 FWHM의 증가 현상이 나타났고 이는 filament spacing이 감소하였기 때문으로 설명된다. 1.55 ${\mu}m$multi-quantum well (MQW) broad area laser diodes with different linewidth enhancement factors ($\alpha{-factor}$) of 2 and 4 were fabricated. The far-fields of the laser diodes were measured. It was observed that the full width at half maximum (FWHM) of the far-fields and the filamentations were reduced in the laser diodes for which the value of the $\alpha{-factor}$ was small. As injection current increased, the FWHM of the far-field also increased regardless of the a-factor. This phenomenon was explained by reduction of filament spacing as injection current increased.

파장대역폭이 넓은 고휘도 발광소자를 위한 Chirped 양자점 구조의 광/전기 특성 분석

한일기,Han, Il-Ki 한국진공학회 2009 Applied Science and Convergence Technology Vol.18 No.5

크기가 다른 양자점 (chirped 양자점) 구조에 대하여 전기발광 (Electroluminescence, EL) 특성과 광발광 (Photoluminescence, PL) 특성을 측정하고 비교 분석하였다. PL 특성에서는 양자점의 기저준위에 의한 피이크가 우세하게 나타난 반면, EL 특성에서는 여기준위에 의한 특성이 우세하게 나타났다. 이와 같은 특성비교로부터 기저준위도 EL 특성에 영향을 미칠 수 있도록 chirped 양자점 구조를 설계하면 파장대역폭이 더욱 넓은 고휘도 발광소자 개발이 가능할 것임을 제안하였다. We analyzed photoluminescence (PL) and electroluminescence characteristics of various chirped quantum dot structures. Peaks in EL curves were contributed by excited states of quantum dots (QD), while those in PL curves by grounded states. Based on these characteristics, we suggested that superluminescent diodes with wide spectral bandwidth may be developed if chirped QD structures are designed to make a contribution by ground states to EL characteristics.

나무에 꿈을 담고

한일기(Il Ki Han) 한국진공학회 2023 진공 이야기 Vol.10 No.2

Trench 구조를 이용한 단일모드형 고휘도 발광소자의 광출력 증가

유영채,한일기,이정일,Yoo, Young-Chae,Han, Il-Ki,Lee, Jung-Il 한국진공학회 2007 Applied Science and Convergence Technology Vol.16 No.5

기저준위의 중심 피크가 $1.3\;{\mu}m$인 다층 양자점 구조를 사용하여 트렌치 구조를 가진 J-형태의 고휘도 발광소자 (superluminescent diodes)를 제작하였다. 도파로와 트렌치 구조 사이의 간격이 좁아지면서 광출력이 최대 20배까지 증가하였음을 확인하였다. 전류의 증가에 의한 EL 피크 측정결과 트렌치 구조를 가진 경우에 여기준위의 피크가 기저준위의 피크보다 수 십배 증가하는 것을 확인하였고, 이로부터 트렌치 증가에 의한 광출력의 증가는 양자점의 여기준위에 의한 것으로 판단하였다. J-shaped superluminescent diodes (SLD) utilizing trench structure have been fabricated on the multiple quantum dots epi-structure with its ground state energy wavelength of $1.3\;{\mu}m$. It was observed that optical power was drastically increased up to 20 times in comparison with that of SLD without trench structure, The electroluminescence characteristics showed that the peak intensity of excited state was several ten times higher in the SLD with trench than without trench structure. It is explained that the optical power enhancement of J-shaped SLD with trench structure resulted from the drastic increase of peak intensity of excited state.

GaAs/AlGaAs 3-Quantum Well 양자폭포레이저 (Quantum Cascade Lasers)에서 허용되는 에피정밀도를 위한 활성영역 모의실험

이혜진,한일기,이정일,김문덕,Lee, Hye-Jin,Lee, Cheng-Ming,Han, Il-Ki,Lee, Jung-Il,Kim, Moon-Deock 한국진공학회 2007 Applied Science and Convergence Technology Vol.16 No.4

양자폭포레이저에서 활성영역의 모의실험을 위하여 Runge-Kutta 방법과 shooting 방법을 이용하여 슈뢰딩거 방정식의 해를 구하였다. 활성영역의 두께 변화에 대하여 발진파장, 포논공명 에너지, 분극행렬요소 (dipole matrix element) 등의 특성변화를 관찰하였고, 이로부터 양자폭포레이저를 위한 에피성장에서 허용될 수 있는 최소한의 두께 정밀도를 제안하였다. For the simulation of active region in the quantum cascade lasers (QCL), we solved Schrodinger equation utilizing Runge-Kutta method and Shotting method. Wavelength, phonon resonant energy, and dipole matrix element were simulated with the variation of active region thickness. As a result of such simulation, it was suggested the tolerance range of epi-layer thickness error when 3-quantum well QCL structures are grown.

양자점 레이저 다이오드의 식각 깊이에 따른 접합온도 측정

정정화,한일기,이정일,Jeong, Jung-Hwa,Han, Il-Ki,Lee, Jung-Il 한국진공학회 2008 Applied Science and Convergence Technology Vol.17 No.6

순방향 전압-온도 (forward voltage-temperature)법을 이용하여 양자점 레이저 다이오드의 접합온도를 측정하였다. 식각 깊이가 깊은 mesa 구조의 경우 입력전류에 대한 접합온도의 증가율은 0.05 K/mA인 반면, 식각 깊이가 낮은 mesa 구조의 경우 0.07 K/mA로서 상대적으로 높게 측정되었다. 깊은 mesa 구조에서의 상대적으로 낮은 접합온도 증가율은 mesa 측면 방향으로의 열확산 효과 때문인 것으로 설명된다. Junction temperature of quantum dot laser diodes is investigated by utilizing forward voltage-temperature method. In the case of ridge type laser diodes with deep mesa the increasing rate of junction temperature to current is about 0.05 K/mA, while in the case of shallow mesa the increasing rate is about 0.07 K/mA. It is explained that the relatively low increasing rate in the deep mesa results from the heat expansion to the lateral direction of mesa.