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반응 스퍼터링법으로 제조한 $Y_2O_3$ 박막의 잔류응력과 성장 방향성
최한메,최시경 한국세라믹학회 1995 한국세라믹학회지 Vol.32 No.8
Y2O3 thin films were deposited by reactive sputtering of Y target in Ar and O2 gas mixture. Residual stress was measrued by sin2$\psi$ method of x-ray diffraction (XRD) and growth orientation was examined by measuring the relative intensity of (400) plane and (222) plane of Y2O3 films. In the case that Y2O3 films were deposited at 40$0^{\circ}C$ and at low working pressure below 0.05 torr the film had large compressive stress and (111) plane orientation. At working pressure of about 0.10 torr the film had small compressive stress and (100) orientation. Above working pressure of 0.20 torr, the films had nearly zero stress and random orientation. In the case that the (111) oriented film deposited at low working pressure below 0.05 torr, as substrate temperature decreased, (111) orientation increased. In the case the film, with (100) orientation, deposited at working pressure of about 0.10 torr, (100) orientation increased with decresing substrate temperature. These relationship of residual stress and growth orientation can be explained by the relationship of surface energy and strain energy.
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D.C Magnetron Reactive Sputtering 법으로 증착한 $PbTiO_3$ 박막의 열처리에 따른 c-축 배향성의 변화
이승현,권순용,최한메,최시경 한국세라믹학회 1996 한국세라믹학회지 Vol.33 No.7
PbTiO3 thin films were fabricated onto MgO(100) single crystal substrate by reactive D. C magnetron sput-tering of Pb and Ti metal in an oxygen and argon gas mixture. The annealing of the thin films resulted in the decrease of both the c-axis orientation ratio and the lattice parameter. It is well known that the c-axis lattice parameter of thin film is dependent on the Pb/(Pb+Ti)ratio and the residual stress in the film The PbTiO3 thin films with a Pb/(Pb+T) ratio ranging from 0.45 to 0.57 were fabricated and annealed. The structure of the film the c-axis orientation ratio and the lattice parameter were not dependent on the Pb/(Pb+Ti) ratio before and after annealing. These experimental results proved that the decrease of the c-axis lattice parameter under the annealing conditions was due to the relaxation of the intrinsic stress in the film. This relaxation of the intrinsic stress caused the decrease of the c-axis orientation ratio and this phenomenon can be explained by c-axis growth lattice model.
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열 필라멘트 CVD법에 의해서 제작한 다이아몬드 막의 잔류응력제어
최시경,정대영,최한메 한국세라믹학회 1995 한국세라믹학회지 Vol.32 No.7
The relaxation of the intrinsic stresses in the diamond films fabricated by the hot filament CVD was studied, and it was confirmed that the tensile intrinsic stresses in the films could be controlled without any degradation in the quality of the diamond films. The tensile intrinsic stresses in the films decreased from 2.97 to 1.42 GPa when the substrate thickness increased from 1 to 10mm. This result showed that the residual stress was affected by the substrate thickness as well as by the interaction between grains. Applying of +50 V between the W filament and the Si substrate during deposition, the tensile intrinsic stress in the film deposited at 0 V was decreased from 2.40 GPa to 0.71 GPa. Such large decrease in the tensile intrinsic stress was due to $\beta$-SiC which acted as a buffer layer for the stress relaxation. However, the application of the large voltage above +200V resulted in the change of quality of the diamond film, and nearly had no effect on relaxation in the tensile intrinsic stress.
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吳明淑,李浚源,催한메 弘益大學校 科學技術硏究所 2002 科學技術硏究論文集 Vol.13 No.-
Laboratory scale coal ashing apparatus was designed and tested. A desirable coal asher should be able to hold about 100 - 200 g coal, to have a short ashing time, and to give uncontaminated ash samples. For fine powder coal samples, an asher with a high temperature ceramic filter was designed. The asher was able to hold about 50 g coal samples, and needed about 30 min of ashing time at 900oC when pure oxygen was fed at 1.5 liter/min. The sample was heated approximated at 10oC/min to 900 oC. The filter eliminated the elutriation of coal particles, but, the produced ash was contaminated by the ceramic glue which was used to attach the filter to the reactor. Coal pellets were used in the reactor without the filter. Pellets were not fluidized, and yet were ashed in 10 min under the same test conditions as in the powder coal ashing. Although making coal pellets presents another time consuming step, the pellet combustion was determined to be the best method to produce a reasonable amount of uncontaminated coal ash in a short period of time.
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열기계적으로 연마한 다이아몬드 막의 적외선 투과도 및 표면구조
정상기,최시경,정대영,최한메,권순용 한국세라믹학회 1995 한국세라믹학회지 Vol.32 No.6
The rough growth surfaces of diamond films fabricated by the hot filament CVD were polished using thermomechanical polishing method. And then, its application to the optical windows was discussed through the measurement of transmittance in the range of infrared radiation and analysis of surfaces structure. The results were compaerd with those of the films polished with conventional mechanicla polishing. The transmittance of the mechanically polished film reached 57~66% over the whole range from 500 to 4000 cm-1. But the transmittance of the film polished with thermomechanical polishing method was reduced below 35%. This decrease in transmittance was due to both the graphitization of diamond on the polished surface and the growth of $\beta$-SiC at diamond/Si interface during polishing. The residual Fe in hte thermomechanically polished surface was confirmed by SIMS analysis. This Fe played the role of the graphitization of near surface region of the diamond film.
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