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정아롱,김준수,윤존도,Jeong, A-Rong,Kim, Jun-Su,Yun, Jon-Do 한국재료학회 2012 한국재료학회지 Vol.22 No.8
Recently nanoscience and nanotechnology have been studied intensively, and many plants, insects, and animals in nature have been found to have nanostructures in their bodies. Among them, lotus leaves have a unique nanostructure and microstructure in combination and show superhydrophobicity and a self-cleaning function to wipe and clean impurities on their surfaces. Coating films with combined nanostructures and microstructures resembling those of lotus leaves may also have superhydrophobicity and self-cleaning functions; as a result, they could be used in various applications, such as in outfits, tents, building walls, or exterior surfaces of transportation vehicles like cars, ships, or airplanes. In this study, coating films were prepared by dip coating method using polypropylene polymers dissolved in a mixture of solvent, xylene and non-solvent, methylethylketon, and ethanol. Additionally, attempts were made to prepare nanostructures on top of microstructures by coating with the same coating solution with an addition of carbon nanotubes, or by applying a carbon nanotube over-coat on polymer coating films. Coating films prepared without carbon nanotubes were found to have superhydrophobicity, with a water contact angle of $152^{\circ}$ and sliding angle less than $2^{\circ}$. Coating films prepared with carbon nanotubes were also found to have a similar degree of superhydrophobicity, with a water contact angle of 150 degrees and a sliding angle of 3 degrees.
황창훈 ( Chang Hun Hwang ),정아롱 ( A Rong Jeong ),이홍림 ( Hong Rim Lee ),조상봉 ( Sang Bong Cho ),윤존도 ( Jon Do Yun ) 경남대학교 신소재연구소 2013 신소재연구 Vol.25 No.-
탄화규소는 그 표면에 형성되는 산화규소막 때문에 고온에 견디는 우수한 내열 내산화성 재료이다. 1800 ℃ 이상의 초고온에서는 산화규소막도 적극적 산화가 일어나며 일산화규소 형태로 증발하므로 보호할 수 있는 코팅막이 부가적으로 필요하다. 본 연구에서는 보호막으로 높은 융점을 가지는 산화이트륨 코팅막을 스프레이 코팅법을 이용하여 제조하였다. 스프레이 코팅과 소결 공정을 통하여 100 마이크론 두께의 견고한 코팅막을 제조할 수 있었으며, 가압 처리할 경우 매우 치밀한 코팅막을 제작할 수 있었다. Silicon carbide is an excellent heat resistant and high oxidation resistant material at high temperature due to silicon oxide film formed on its surface. However silicon oxide film is degraded by active oxidation and vaporized to silicon monoxide at high temperature over 1800℃. Thus, additional coating film is required for protecting silicon oxide film. In this study, yttrium oxide coating film having high melting point was prepared to overcome this problem. Films were prepared by spray coating method or brush method. The microstructure and chemical composition were examined before and after the test with scanning electron microscopy and electron probe microanalysis.
대상포진 후 피부의 2차 감염으로 인한 단독 증례 보고 1례
김하얀,김선미,하광수,하수연,송인선,정아롱,홍솔이,Kim, Ha-Yan,Kim, Sun-Mi,Ha, Kwang-Su,Ha, Su-Yun,Song, In-Seon,Jeong, A-Rong,Hong, Sol-Yi 대한한방소아과학회 2006 대한한방소아과학회지 Vol.20 No.3
Objectives : There were few reports on Erysipelas, from Secondary Skin Infection after Herpes Zoster. We treated Erysipelas, from Secondary Skin Infection after Herpes Zoster with Oriental medical approach, and got a significant results. So We are reporting this case. Methods : Herb medication, acupuncture treatment were applied for treating patient`s chief symptoms (erythema, heat sensation, swelling, pain, itching and general weakness) Results : The patient was 5-year-old boy who had the symptoms caused by Erysipelas, which was caused by secondary skin infection after herpes zoster. He had erythema, heat sensation, swelling, pain, itching and general weakness. We judged him as Soyangin(少陽人), and prescribed Hyeongbangsaback-san. After he took Hyeongbangsaback-san, the symptom and general condition were improved. In this report, we want to explain the healing process and the result of the treatment of Erysipelas. Conclusions : More study about oriental treatment on Erysipelas, from Secondary Skin Infection after Herpes Zoster is needed.
간비불화(肝脾不和)와 식적(食積)으로 변증된 신경성 폭식증 치험 1례
김효주,곡경내,이지원,차혜진,서영민,박세진,정아롱,Kim, Hyo-Ju,Chu, Ching-Nai,Lee, Ji-Won,Cha, Hye-Jin,Seo, Young-Min,Park, Se-Jin,Jeong, A-Rong 대한한방신경정신과학회 2008 동의신경정신과학회지 Vol.19 No.3
The purpose of this study is to identify the effect on a patient with bulimia nervosa-purging type and depression according to the oriental medical treatment and cognitive-behavioral therapy. In this case, a 28 year-old female patient had a binge eating and reward behaviors for 2 years. This patient was treated with acupunture therapy, Soyo-san for 5 months after cognitive-behavioral therapy for 12 sessions(2 times a week). The result of this research showed that bulimia nervosa with depression was improved by our treatment.
김준수 ( Jun Su Kim ),황창훈 ( Chang Hun Hwang ),정아롱 ( A Rong Jeong ),이홍림 ( Hong Lim Lee ),윤존도 ( Jon Do Yun ) 경남대학교 신소재연구소 2012 신소재연구 Vol.24 No.-
탄화규소 물질은 고온에서 표면에 산화규소 비정질막을 형성한다. 형성된 산화규소막은 고온에서의 산소투과율, 열팽창계수, 증기압 등 고온물성이 우수하여 모재를 잘 보호하기 때문에 탄화규소는 우수한 내열 내산화성을 보인다. 하지만, 1500℃ 이상의 초고온에서는 산화규소막도 적극적 산화(active oxidation)가 일어나며 일산화규소 형태로 증발하므로 산화 규소막을 보호할 수 있는 보호막이 필요하다. 본 연구에서는 적당한 보호막 물질로 대상이 되는 여러 가지 고온용 산화물을 매핑하여 융점이 높고 증기압이 낮으며 열팽창계수가 작고 탄화규소와의 고온 반응성을 고려하여 산화이트륨 물질을 선택하였다. 산화이트륨 코팅막을 제조하기위해 여러 가지 산화이트륨 전구체를 이용한 졸-겔법과 플라즈마 용사를 이용하여 산화이트륨 코팅막의 제조를 시도하였고 제조한 코팅막에 대한 미세구조분석 및 산화시험을 실시하였다. 그 결과, 산화이트륨을 장착한 탄화규소의 산화가 거의 일어나지 않은 것으로 나타났으며, 산화이트륨이 치밀화하여 기공이 없어졌고 산화규소와 반응하지 않는 것으로 나타났다. Silicon carbide is an excellent thermal and oxidation resistance material because silicon oxide amorphous film is formed on the surface by oxidation at high temperature. silicon oxide films had very low oxygen permeability, very low thermal expansion coefficient, and very low vapor pressure at high temperature. However, at temperature over 1500℃, silicon oxide films also are rapidly oxidized and evaporated in an active oxidation mode. Therefore, protecting shields for silicon oxide film are required. Due to its high melting melting point, low vapor pressure, low thermal expansion coefficient and low reactivity with silicon carbide at high temperature, yttrium oxide was selected. yttrium oxide coating films were prepared using sil-gel method or plasma spray method. Microstructure of yttrium oxide coating was analyzed and oxidation tests were conducted. As a result, yttrium oxide coating also densified, and the pores disappeared. Also no reaction between yttrium oxide and silicon oxide occurred.
김준수 ( Jun Su Kim ),이재호 ( Jae Ho Lee ),황창훈 ( Chang Hun Hwang ),정아롱 ( A Rong Jeong ),이홍림 ( Hong Lim Lee ),조상봉 ( Sang Bong Cho ),윤존도 ( Jon Do Yun ) 경남대학교 신소재연구소 2012 신소재연구 Vol.24 No.-
탄화규소는 그 표면에 형성되는 산화규소막 때문에 고온에 견디는 우수한 내열 내산화성 재료이다. 하지만, 1500℃ 이상의 초고온에서는 산화규소막도 적극적 산화(active oxidation)가 일어나며 일산화규소 형태로 증발하므로 산화규소막을 보호할 수 있는 보호막이 필요하다. 본 연구에서는 탄화규소의 보호막으로 이트륨 산화물을 선택하여 탄소/탄소 복합체 기판 위의 다층박막을 1층 SiC, 2층 SiOC+SiC, 3층 Y2O3, 4층 Y2SiO5 유리질을 추가하는 것으로 설계하여 고온 가열시 발생할 수 있는 열응력에 대하여 아바쿠스 프로그램을 이용하여 해석을 실시하였다. 그 결과, 온도 상승과 함께 다층박막에 발생하는 최대 전단응력은 4,058 MPa로 매우 크고 각진 모서리 부분에 응력이 집중하는 것으로 나타났고, 각진 모서리를 둥근 모서리로 바꾸어 주면 최대응력 52.6 % 감소함과 동시에 응력 집중 현상도 사라지는 것을 알 수 있었다. 그리고 SiOC+SiC층이 고온에서 연화하여 점성유동을 할 경우 고온에서 열응력의 대부분을 완화시킬 것으로 보여진다. The silicon carbide is excellent heat-resistant anti-oxidative materials enduring high temperature because of silicon oxide film formed on the surface of silicon carbide. But shields are required that can protect the silicon oxide film because silicon oxide is rapidly oxidized in an activated oxidation mode and is evaporated as a form of silicon monoxide at 1500 ℃ or higher temperatures. In this study, thermal stress in multilayer coating of SiC, SiOC/SiC, Y2O3 and Y2SiO5 glass layers for C/C composites during high temperature heating were examined by computer simulation of finite element analysis using Abaqus program. As a result, maximum shear stress of 4,058 MPa was found to be concentrated at sharp edges. Converting the sharp edge to rounded one made 52.6% reduction in the maximum stress. If amorphous material is softened and the viscous flows are made, it was found that most of the thermal stress disappeared.