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Fabrication of Epitaxial fcc Co/Cu Nanostructures/Si(001)
H. M. Hwang,이재용,이현휘,H.S. Lee,이종한,J. H. Song,J. H. Kang,J.-Y. Choi,신상원 한국물리학회 2006 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.49 No.3
Isolated epitaxial Co(5 nm tCo 30 nm)/Cu nanostructures have been fabricated on a Si(001) substrate by using a nanoporous anodic aluminum-oxide (AAO) film as a mask during evaporation. The structural and the magnetic properties of the nanostructures are compared with those of asgrown films. The results of X-ray diraction confirm that both the film and the nanostructure have a fcc structure with a (001) surface and a Co[110]//Cu[110]//Si[001] crystallographic relation in the plane. The nanostructures with tCo 10 nm show clear four-fold symmetry of the remanent magnetization in the plane, but due to dipole interactions among nanodots, their values are smaller than those of films. The nanostructure with tCo = 5 nm shows isotropic hysteresis loops while the film with the same thickness shows a four-fold symmetry.
이온빔 나노 패터닝을 위한 양극산화 알루미나의 이온빔 투과
신상원,이종한,이성구,이재용,황정남,최인훈,이관희,정원용,문현찬,김태곤,송종한,Shin S. W.,Lee J-H,Lee S. G.,Lee J.,Whang C. N.,Choi I-H,Lee K. H.,Jeung W. Y.,Moon H.-C.,Kim T. G.,Song J. H. 한국진공학회 2006 Applied Science and Convergence Technology Vol.15 No.1
양극 산화된 알루미나 (anodized aluminum oxide : AAO)는 균일하고 일정한 크기의 나노기공 패턴을 지니고 있다. AAO를 이온빔 나노 patterning을 위한 이온조사 시 마스크로서 이용하기 위해 AAO 나노 기공을 통과하는 이온빔의 투과율(AAO에 입사한 이온에 대한 투과이온의 양의 비)을 측정하였다. Al bulk foil을 양극 산화하여 두께가 $4{\mu}m$이고 종횡비(두께와 기공의 지름의 비)가 각각 200:1, 100:1 인 AAO를 Goniometer에 부착하여 500 keV의 $O^{2+}$ 이온빔에 대해 나노기공을 정렬시킨 후, 기울임 각에 따른 투과율을 측정한 결과, 종횡비가 200:1, 100:1 일 때 투과율은 각각 약 $10^{-8},\;10^{-4}$로 거의 이온빔이 투과하지 못하였다. 반면에 $SiO_2$ 위에 증착된 Al 박막으로 양극산화하여 종횡비가 5:1인 AAO의 이온빔 투과율은 0.67로 투과율이 현저히 향상되었다. 높은 종횡비를 갖는 AAO의 경우에는 범과 AAO 기공의 정렬이 쉽지 않은데다 알루미나의 비전도성으로 인한 charge-up 현상으로 인해 이온빔이 극히 투과하기 어렵기 때문이다. 실제로 80 keV의 Co 음이온을 종횡비 5:1인 AAO에 조사시킨 후에는 AAO 나노기공과 동일한 크기의 나노 구조체가 형성됨을 주사전자현미경(scanning electron microscopy: SEM) 관찰을 통하여 확인하였다. Anodic alumina with self-organized and ordered nano hole arrays can be a good candidate of an irradiation mask to modify the properties of nano-scale region. In order to try using porous anodic alumina as a mask for ion-beam patterning, ion beam transmittance of anodic alumina was tested. 4 Um thick self-standing AAO templates anodized from Al bulk foil with two different aspect ratio, 200:1 and 100:1, were aligned about incident ion beam with finely controllable goniometer. At the best alignment, the transmittance of the AAO with aspect ratio of 200:1 and 100:1 were $10^{-8}\;and\;10^{-4}$, respectively. However transmittance of the thin film AAO with low aspect ratio, 5:1, were remarkably improved to 0.67. The ion beam transmittance of self-standing porous alumina with a thickness larger than $4{\mu}m$ is extremely low owing to high aspect ratio of nano hole and charging effect, even at a precise beam alignment to the direction of nano hole. $SiO_2$ nano dot array was formed by ion irradiation into thin film AAO on $SiO_2$ film. This was confirmed by scanning electron microscopy that the $SiO_2$ nano dot array is similar to AAO hole array.
Fabrication and Structural Analysis of an Epitaixal Ni/Cu(001) Nanostructure on a Si Substrate
S. G. Lee,이재용,이현휘,H. S. Lee,J. H. Song,이종한,J.-Y. Choi,신상원 한국물리학회 2007 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.51 No.I
An epitaxial Ni(4.5 nm -- 100 nm)/Cu nanostructure has been fabricated on a Si(001) substrate by using nanoporous anodic aluminum oxide (AAO) as a mask during evaporation. Both the nanosized Cu and Ni layers have (001) surfaces with a Ni $<$110$>$ $//$ Cu $<$110$>$ $//$ Si $<$001$>$ in-plane relation. The Ni nanostructure is found to be less strained than the film at the same Ni thickness, which plays a crucial role in determining the magnetic anisotropy of the nanostructure. Combining a self-assembled AAO mask with a conventional evaporation method can be a potential technique, instead of traditional lithography, for the growth of various epitaxial metal nanostructures.
이성구(S. G. Lee),신상원(S. W. Shin),이재용(J. Lee),이종한(J. H. Lee),김태곤(T. G. Kim),송종한(J. H. Song) 한국자기학회 2004 韓國磁氣學會誌 Vol.14 No.3
Array of magnetic Ni nanostructures has been fabricated on Si substrate by using nanoporous alumina film as a mask during deposition. The nanostructures are truncated cone-shape and the lateral sizes are comparable to height. While the continuous film shows well-defined in-plane magnetization, the nanostructure shows perpendicular component of magnetization at remanence. The hysterectic behavior of nanostructures is dominated by the demagnetizing field instead of interaction among them.
Fabrication of Isolated Magnetic Nanostructures by Using Nanoporous Anodic Alumina Films on Si
S. G. Lee,신상원,이재용,이종한,T.G.Kim,J. H. Song 한국물리학회 2005 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.46 No.1
Arrays of magnetic Ni nanostructures have been fabricated on a Si substrate by using ananoporous alumina film as a mask during the deposition. The nanostructures have a truncated cone shape, and the lateral sizes are comparable to the heights. While a continuous film shows well-defined in-plane magnetization, the nanostructure has a perpendicular component of the magnetization at remanence. The hysteretic behavior of the anostructures is dominated by the demagnetizing field instead of by interaction among the structures.