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대면적 나노 임프린트 리소그래피를 위한 정렬장치의 개발
이진영(Jinyoung Lee),박영걸(Younggul Park),박인수(Insoo Park),임홍재(Hongjae Yim),장시열(Siyoul Jang),이기성(Keesung Lee),신동훈(Donghoon Shin),임시형(Si-Hyung Lim),정재일(Jay I. Jeong) 한국생산제조학회 2007 한국공작기계학회 춘계학술대회논문집 Vol.2007 No.-
We developed an alignment system for large area nano-imprint lithography. The alignment device is composed of vision part, drive part and control part. The vision part consists of two fine cameras and two pre cameras. These four cameras are used for searching target marks and object marks. The drive part is made up of three servo motors and three motor drives. According to control command, three servo motors drive stage with 1㎛ axis accuracy. The control part consists of control PC and Fv-aligner, Based on vision image information, Fv-aligner calculates U,V,W Axis Calibration values. After that, relative position between mark of mold and mark of glass will be adjusted. Besides three parts, there are UV-lamp part and laser calibration part.