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간경변에 합병된 원발성 세균성 복막염에 있어서 복수의 세균배양검사의 의의
이학중(Hak Choong Lee),백영건(Yeong Keon Baek),우연미(Yeon Mi Woo),권영근(Yeong Keun Kwon),민경업(Kyung Up Min) 대한소화기학회 1985 대한소화기학회지 Vol.17 No.1
N/A The spontaneous bacterial peritonitis (SBP) is very grave complication in cirrhotics, and early diagnosis and treatment is crucial for good management. Authors studied clinical features and diagnostic value of laboratory findings in SBP, which was confirmed by bacteriological culture of ascites. The results obtained were summarized as follows: 1) The incidences of abdominal pain, tenderness and rebound tenderness in SBP were significantly higher than those of controls. 2) The levels of serum protein, bilirubin, and WBC counts in ascitic fluid were different significantly between SBP and controls. 3) In spite of the differences between SPB and controls, it was unsuitable to apply these findings in the diffential diagnosis of bacterial infection because there were significantly high risks of false positive and false negative. On the bases of these findings, it is suggested that culture of ascitic fluid is mandatory to detect bacterial infection early, even though clinical findings are not suggestive of bacterial infection
거친 표면을 가진 흡수체와 버퍼의 측면에 의한 극자외선 산란효과
권영근,심상진,김종회,김옥경,오혜근 한양대학교 이학기술연구소 2003 이학기술연구지 Vol.6 No.-
마스크 상의 거친 표면을 정의하기 위해서 Monte-Carlo 방법이 적용되었다. 극자외선 마스크의 거친 표면 함수, 즉 power spectral density 에 의해 표현된 무작위적인 표면의 높이 변화는 상면에서의 전기장을 계산하기 위해서 재정의 되었다. Feynmann의 접근 방식과 유사한 산란에 대한 일반식을 유도하였고, 이는 결상과정에서 마스크의 단차상의 거친 측면에 의한 효과를 알아보기 위해서 적용되어졌다. 거친 표면과 완전히 편평한 표면에 대한 전기장의 위상과 진폭 변화 정도를 비교하기 위해서 다중 산람 문제 또한 여러 다른 패턴에 대하여 이 논문에서 다뤄졌다. The Monte-Carlo Method is adopted to define the roughness of the mask structure. A random surface height variation described by power spectral density for the rough surfaces of an estreme ultraviolet (EUV) mask is to be redefined to calculate the field in the image plane. A general explicit formula of the scattering, which is analogous to Feynman's approach, is derived, and it is adapted to the EUV mask structure to evaluate the effect of the surface roughness of the side wall of the mask topography on the image formation. The multiple random scattering problems are dealt with the different pattern types in order to compare field variations in phase and amplitude with the ideal flat surface.