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Patterned immobilization of biomolecules by using ion irradiation-induced graft polymerization
Choi, Jae-Hak,Ganesan, Ramakrishnan,Kim, Dong-Ki,Jung, Chan-Hee,Hwang, In-Tae,Nho, Young-Chang,Yun, Je-Moon,Kim, Jin-Baek Wiley Subscription Services, Inc., A Wiley Company 2009 Journal of polymer science Part A, Polymer chemist Vol.47 No.22
<P>A new method for biomolecular patterning based on ion irradiation-induced graft polymerization was demonstrated in this study. Ion irradiation on a polymer surface resulted in the formation of active species, which was further used for surface-initiated graft polymerization of acrylic acid. The results of the grafting study revealed that the surface graft polymerization using 20 vol % of acrylic acid on the poly(tetrafluoroethylene) (PTFE) film irradiated at the fluence of 1 × 10<SUP>15</SUP> ions/cm<SUP>2</SUP> for 12 h was the optimum graft polymerization condition to achieve the maximum grafting degree. The results of the fluorescence microscopy also revealed that the optimum fluence to achieve the maximum fluorescence intensity was 1 × 10<SUP>15</SUP> ions/cm<SUP>2</SUP>. The grafting of acrylic acid on the PTFE surfaces was confirmed by a fluorescence labeling method. The grafted PTFE films were used for the immobilization of amine-functionalized p-DNA, followed by hybridization with fluorescently tagged c-DNA. Biotin-amine was also immobilized on the acrylic acid grafted PTFE surfaces. Successful biotin-specific binding of streptavidin further confirmed the potential of this strategy for patterning of various biomolecules. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 6124–6134, 2009</P> <B>Graphic Abstract</B> <P>An efficient method for biomolecular patterning based on ion irradiation-induced graft polymerization has been demonstrated. Ion irradiation resulted in the formation of active species on the polymer surface, which in turn was utilized for graft polymerization of acrylic acid. Polymerization conditions were optimized to yield maximum grafting degree of poly(acrylic acid) onto the PTFE. The application of this platform for biomolecular patterning has been successfully demonstrated by patterning DNA and streptavidin on the poly(acrylic acid)-grafted PTFE substrates. This method is capable of grafting various functional groups such as amide and alcohol onto a variety of polymer substrates. [Color figure can be viewed in the online issue, which is available at www.interscience.wiley.com.] <img src='wiley_img/0887624X-2009-47-22-POLA23655-gra001.gif' alt='wiley_img/0887624X-2009-47-22-POLA23655-gra001'> </P>
Simple Patterning of Cells on a Biocompatible Nonchemically Amplified Resist
Kim, Jin-Baek,Ganesan, Ramakrishnan,Yoo, So Young,Choi, Jae-Hak,Lee, Sang Yup Hu@thig & Wepf 2006 Macromolecular Rapid Communications Vol.27 No.17
<P>Summary: A simple lithographic process in conjunction with a novel biocompatible nonchemically amplified photoresist material was successfully used for cell patterning. UV light irradiation on selected regions of the nonchemically amplified resist film renders the exposed regions hydrophilic by the formation of carboxylic groups. Mouse fibroblast cells were found to be preferentially aligned and proliferated on the UV light exposed regions of the nonchemically amplified resist film where carboxylic groups were present.</P><P> <img src='wiley_img/10221336-2006-27-17-MARC200600364-gra001.gif' alt='wiley_img/10221336-2006-27-17-MARC200600364-gra001'> Graphic Schematic representation of the simplified lithographic process used for cell patterning. </P>
Photobleachable silicon-containing molecular resist for deep UV lithography
Kim, Jin-Baek,Ganesan, Ramakrishnan,Choi, Jae-Hak,Yun, Hyo-Jin,Kwon, Young-Gil,Kim, Kyoung-Seon,Oh, Tae-Hwan Royal Society of Chemistry 2006 Journal of materials chemistry Vol.16 No.34
<P>A novel molecular resist material based on polyhedral oligomeric silsesquioxane, possessing diazoketo groups, was successfully synthesized for deep UV lithography. The initial lithographic evaluation of the molecular resist shows the potential of the new platform for the next generation resists.</P> <P>Graphic Abstract</P><P>A novel molecular resist material based on polyhedral oligomeric silsesquioxane, possessing diazoketo groups, was synthesized. Initial lithographic evaluation shows the potential of the new platform for next generation resists. <IMG SRC='http://pubs.rsc.org/services/images/RSCpubs.ePlatform.Service.FreeContent.ImageService.svc/ImageService/image/GA?id=b606937a'> </P>