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355㎚ UV 레이저를 이용한 AZ5214와 SU-8 포토레지스트 어블레이션에 관한 연구
오재용(J. Y. Oh),신보성(B. S. Shin),김호상(H. S. Kim) 한국레이저가공학회 2007 한국레이저가공학회지 Vol.10 No.2
We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with F-θ lens. AZ5214 and SU-8 photoresist are chosen as experimental materials and a kind of well-known positive and negative photoresist respectively. Laser ablation mechanism depends on the optical properties of polymer. In this paper, therefore we investigate the phenomenon of laser ablation according to the laser fluence variation and measure the shape profile of micro patterned holes. From these experimental results, we show that LDWL is very useful to process various micro patterns directly.
355nm UV 레이저를 이용한 AZ5214와 SU-8 포토레지스트 어블레이션에 관한 연구
오재용,신보성,김호상,Oh, J.Y.,Shin, B.S.,Kim, H.S. 한국레이저가공학회 2007 한국레이저가공학회지 Vol.10 No.2
We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with $F-{\theta}$ lens. AZ5214 and SU-8 photoresist are chosen as experimental materials and a kind of well-known positive and negative photoresist respectively. Laser ablation mechanism depends on the optical properties of polymer. In this paper, therefore we investigate the phenomenon of laser ablation according to the laser fluence variation and measure the shape profile of micro patterned holes. From these experimental results, we show that LDWL is very useful to process various micro patterns directly.
레이저 가열을 이용한 LCD 컬러 필터 프린팅 공정에 관한 연구
나성준(S. J. Na),이재학(J. H. Lee),유중돈(C. D. Yoo) 한국레이저가공학회 2007 한국레이저가공학회지 Vol.10 No.2
A new printing process for LCD color filter is proposed in this work by using the localized laser heating, which is called laser-induced spray printing (LISP) process. The LISP is a non-contact process, which injects the ink from the donor substrate to the glass substrate by the bubble pressure induced by laser heating. The temperature distribution of the donor substrate is calculated numerically to explain the ink ejection phenomena. The composition of the ink was includes the red pigment, n-butanol, xylene, BCA and epoxy. Experiments were conducted by using the fiber laser system, and the color filter patterns were deposited successfully under the proper laser heating conditions.
광단층결맞음영상기를 이용한 레이저 직접 묘화 패턴의 비파괴적 검사
이승석,김주하,이동헌,최은서,김영섭,신동혁,정승호,이지영 한국물리학회 2016 New Physics: Sae Mulli Vol.66 No.10
In this research, a non-destructive cross-sectional image of a photosensitive glass, where grid patterns were imaged by using laser direct imaging (LDI), was obtained and analyzed to check the performance of a commercially-developed LDI system. Optical coherence tomography (OCT) was utilized to obtain high-resolution cross-sectional images of the grid patterns without any physical damage to samples. Two samples were prepared: One was imaged by using only LDI and had only the grid patterns. The other was treated by post-processing such as baking and etching after the same treatment as was used for the former sample. By using high-resolution OCT images acquired in real time, we were able to investigate the features of the patterns imaged on the photosensitive glass in detail by reconstructing the cross-sectional views along the transverse and the vertical directions. The results matched those from a microscope inspection of sectioned sample well. From the OCT images, the performance of the commercially-developed LDI system could be visually evaluated without sample sectioning. If this merit is exploited OCT may be appplied to optimize the processing efficiency. 본 논문에서는 상용품으로 개발된 레이저 직접 묘화 시스템의 성능을 확인하고자 레이저 직접 묘화로 그려진 광감성 유리의 단층 영상을 비파괴적으로 획득하여 분석하였다. 샘플의 손상없이 격자 패턴에 대한 고해상도 단층 영상을 얻기 위해서 광단층결맞음촬영기(optical coherence tomography, OCT)를 이용하였다. 샘플은 다음과 같이 두 가지를 준비하였다: 한 샘플은 레이저 직접 묘화로 격자 패턴만을 그렸고, 다른 샘플은 처음 샘플과 동일한 격자 패턴을 그린 후 후처리 과정인 열처리와 식각과정을 거쳤다. 실시간으로 획득된 OCT 영상을 이용하여 수평방향 및 수직방향의 단층영상으로 재구현함으로써 광감성 유리에 그려진 패턴의 내부 특성을 자세하게 검사할 수 있었다. 재구현된 OCT 영상을 통해서 확인한 결과 두 샘플 모두 격자 패턴이 후처리 과정과는 무관하게 샘플 깊이 방향으로 잘 유지되고 있었다. 이는 샘플을 절개하여 현미경으로 관찰할 결과와 동일하였다. OCT를 이용함으로써 기존의 광학기법의 한계를 극복하고 좁은 선폭으로 깊게 가공된 패턴에 대한 정보를 손쉽게 획득할 수 있었다. OCT 영상을 이용함으로써 상용품으로 개발된 레이저 직접 묘화 시스템의 노광 성능을 샘플의 물리적인 절개 없이도 시각적으로 평가 할 수 있었다.
Fabrication of Dual-Line by Using a Laser Ablation Phenomenon in Direct Laser Lithographic System
김영광(Young-Gwang Kim),안누호앙(Nguyen Nu Hoang Anh),이혁교(Hyug-Gyo Rhee),김영식(Young-Sik Ghim) Korean Society for Precision Engineering 2019 한국정밀공학회지 Vol.36 No.11
Diffractive Optical Element (DOE) composed of repetitive patterns is necessary for 3D measurement, or for converting a laser beam into several spots. In this study, DOEs were fabricated through a direct laser lithographic system of which it is easy to fabricate a pattern on the specimen at low cost and under relatively simple process conditions. A commonly used method in laser direct laser lithography is the thermochemical technique. In this way, a single-line can be produced. At this time, when the high power of the laser is used, the laser ablation phenomenon occurs, so that a dual-line can be produced. As a result, it is possible to fabricate a pattern quickly with the proposed process method. And especially, it can increase the effect in repetitive patterns production. To fabricate repetitive fine patterns using dual-line, hexagonal and tripleshaped patterns were fabricated, by using the writing speed and laser intensity appropriately. Optical performance evaluation was performed by comparing the diffracted image of the fabricated hexagonal repetitive patterns with the simulation result.
Parametric Study for a Diffraction Optics Fabrication by Using a Direct Laser Lithographic System
김영광(Young-Gwang Kim),이혁교(Hyug-Gyo Rhee),김영식(Young-Sik Ghim),이윤우(Yun-Woo Lee) Korean Society for Precision Engineering 2016 한국정밀공학회지 Vol.33 No.10
A direct laser lithography system is widely used to fabricate various types of DOEs (Diffractive Optical Elements) including lenses made as CGH (Computer Generated Hologram). However, a parametric study that uniformly and precisely fabricates the diffractive patterns on a large area (up to 200 mm X 200 mm) has not yet been reported. In this paper, four parameters (Focal Position Error, Intensity Variation of the Lithographic Beam, Patterning Speed, and Etching Time) were considered for stabilization of the direct laser lithography system, and the experimental results were presented.
김광열,Kim, Kwang-Ryul 한국재료학회 2007 한국재료학회지 Vol.17 No.7
Since a pattern defects "repair" system using a diode pumped solid state laser for Flat Panel Display (FPD) was suggested, a lot of laser systems have been explored and developed for mass-production microfabrication process. A maskless lithography system using 405 nm violet laser and Digital Micromirror Device (DMD) has been developed for PDP and Liquid Crystal Display (LCD) Thin Film Transistor (TFT) photolithography process. In addition, a "Laser Direct Patterning" system for Indium Tin Oxide (ITO) for Plasma Display Panel(PDP) has been evaluated one of the best successful examples for laser application system which is applied for mass-production lines. The "heat" and "solvent" free laser microfabrications process will be widely used because the next-generation flat panel displays, Flexible Display and Organic Light Emitting Diode (OLED) should use plastic substrates and organic materials which are very difficult to process using traditional fabrication methods.
류기택,김민욱,성진우,김광호,강명창 대한기계학회 2015 JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY Vol.29 No.1
This paper describes the results of the application of laser direct imaging (LDI) lithography for dimensional tolerance improvementthrough surface treatment of cutting edge in the flexible fine dies (FFD). Laser direct imaging lithography was successfullyperformed on AISI W1-8 substrates by a specifically designed laser system using UV 355 nm light source. The characteristics ofpatterned line width according to conditions such as scan speed and multi pass were investigated by optical microscope. The averageline width of LDIed patterns was observed to be about 1 mm. The experimental results show that the line width of patternedsamples was reduced with increasing scan speed and decreasing repetition number (R/N) of scanning. This conclusion proves thefeasibility in the selectively application for manufacturing flexible fine die.
다중 패턴의 회절광학소자 제작을 위한 레이저 직접 노광시스템의 공정 연구
김영광,이혁교,김영식,이윤우 한국반도체디스플레이기술학회 2019 반도체디스플레이기술학회지 Vol.18 No.2
Diffractive Optical Elements(DOEs) diffracts incident light using the diffraction phenomenon of light to generate a desired diffraction image. In recent years, the use of diffraction optics, which can replace existing refractive optical elements with flat plates, has been increased by implementing various optical functions that could not be implemented in refractive optical devices and by becoming miniaturized and compacted optical elements. Direct laser lithography is typically used to effectively fabrication such a diffractive optical element in a large area with a low process cost. In this study, the process conditions for fabricating patterns of diffractive optical elements in various shapes were found using direct laser lithographic system, and optical performance evaluation was performed through fabrication.