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BLT박막의 화학적기계적연마 공정시 패턴 크기에 따른 공정 특성
신상헌(Sang-Hun Shin),이우선(Woo-Sun Lee) 대한전기학회 2006 대한전기학회 학술대회 논문집 Vol.2006 No.10
In this work, we first applied the chemical mechanical polishing (CMP) process to the planarization of ferroelectric film in order to obtain a good planarity of electrode/ferroelectric film interface. Bi<SUB>3.25</SUB>La<SUB>0.75</SUB>Ti₃O₁₂ (BLT) ferroelectric film was fabricated by the sol-gel method. However, there have been serious problems in CMP in terms of repeatability and defects in patterned wafer. Especially, dishing & erosion defects increase the resistance because they decrease the interconnect section area, and ultimately reduce the lifetime of the semiconductor. Cross-sections of the wafer before and after CMP were examined by Scanning electron microscope(SEM). Process characteristics of non-dishing and erosion were investigated.
Bi<SUB>3.25</SUB>La<SUB>0.75</SUB>Ti₃O₁₂(BLT) 박막의 CMP 메커니즘 연구
신상헌(Sang-Hun Shin),고필주(Pil-Ju Ko),김남훈(Nam-Hoon Kim),이우선(Woo-Sun Lee) 대한전기학회 2006 대한전기학회 학술대회 논문집 Vol.2006 No.7
In this paper, we first applied the chemical mechanical polishing (CMP) process to the planarization of ferroelectric film in order to obtain a good planarity of electrode/ferroelectric film interface. Bi<SUB>3.25</SUB>La<SUB>0.75</SUB>Ti₃O₁₂ (BLT) ferroelectric film was fabricated by the sol-gel method. Removal rate and non-uniformity (WIWNU%) were examined by change of silica slurries pH(10.3, 11.3, 12.3). Surface roughness of BLT thin films before and after CMP process was inquired into by atomic force microscopy (AFM). Effects of silica slurries pH(10.3, 11.3, 12.3) were investigated on the CMP performance of BLT film by the surface analysis of X-ray photoelectron spectroscopy(XPS).
신상헌 ( Sang Heun Shin ),이명헌 ( Myung Hun Lee ) 한국환경정책학회 2007 環境政策 Vol.15 No.1
본 연구는 보다 환경친화적인 행위를 유발하는 환경교육방법을 개발하여 결과적으로 환경보호방법을 개선하는데 연구의 목적을 두고 있다. 설문조사에 의해 생성된 여섯 가지 변수들; i) 간접교육 ii) 직접교육 iii) 환경지식 iv) 개인수동행위 v) 개인능동행위 그리고 vi) 대중운동을 근거로 연구모형을 도출하였다. 설정된 10개의 경로가설은 구조방정식모형(Structural Equation Modeling)으로 검증하였다. 연구결과의 한 예를 들면 직접교육방식이 간접교육방식보다 환경지식증가에 긍정적인 영향을 주고, 대상자들을 환경친화적으로 이끄는데 더 효과적으로 밝혀 졌다. 또한 간접교육방식은 개인의 수동적 환경보호활동을 증가시키는 것으로 나타났다.
건축물 외단열재의 열전달평가를 통한 화재 억제 방안 연구
류화성 ( Ryu Hwa Sung ),신상헌 ( Shin Sang Hun ),송성용 ( Song Sung Young ),김득모 ( Kim Deuck Mo ) 한국건축시공학회 2018 한국건축시공학회 학술발표대회 논문집 Vol.18 No.1
Improvement of insulation performance of buildings is a major part. Adiabatic method The adiabatic method minimizes the heat loss of the building. External insulation uses insulation to prevent fire. Ambient air hazards are less prone to fire. When a fire occurs, a phenolic pattern is formed and bond strength with the wall increases. EPS insulation and phenol foam were used to compare external heat transfer and external heat transfer. The heat transfer properties of phenolic foam and styrofoam were evaluated as follows. In the mortar and styrofoam structure, the problem of styrofoam reaching the burning point occurred before the collapse of the mortar, and the phenol foam had a problem in that when the direct fire was continued on the phenol foam, , The characteristics of continuous infiltration appeared. In the case of mortar and phenol foam + styrofoam, the heat penetrated into the interior due to the shrinkage due to the shrinkage of the carbon screen on the phenol foam. However, when reinforced with glass mesh on the outer surface, And to reduce infiltration.
대면적 박막 태양전지 적용을 위한 CdTe 박막의 화학적기계적연마 공정 특성
양정태(Jung Tae Yang),신상헌(Sang-Hun Shin),이우선(Woo-Sun Lee) 대한전기학회 2009 전기학회논문지 Vol.58 No.6
Cadmium telluride (CdTe) is one of the most attractive photovoltaic materials due to its low cost, high efficiency and stable performance in physical, optical and electronic properties. Few researches on the influences of uniform surface on the photovoltaic characteristics in large-area CdTe solar cell were not reported. As the preceding study of the effects of thickness-uniformity on the photovoltaic characteristics for the large-area CdTe thin film solar cell, chemical mechanical polishing (CMP) process was investigated for an enhancement of thickness-uniformity. Removal rate of CdTe thin film was 3160 ㎚/min of the maximum value at the 200 gf/㎠ of down force (pressure) and 60 rpm of table speed (velocity). The removal rate of CdTe thin film was more affected by the down force than the table speed which is the two main factors directly influencing on the removal rate in CMP process. RMS roughness and peak-to-valley roughness of CdTe thin film after CMP process were improved to 96.68% and 85.55%, respectively. The optimum process condition was estimated by 100 gf/㎠ of down force and 60 rpm of table speed with the consideration of good removal uniformity about 5.0% as well as excellent surface roughness for the large-area CdTe solar cell.