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RISS 인기검색어
- 검색키워드
- 저자 : Zuhair S. Khan (검색결과 3 건)
- 무료
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Asghar Ali,Zuhair S. Khan,Mahmood Jamil,Yaqoob Khan,Nisar Ahmad,S. Ahmed 한국물리학회 2018 Current Applied Physics Vol.18 No.5
We developed sulfonated, reduced graphene oxide (S-RGO) through fuming/concentrated sulfuric acid treatment of graphene oxide (GO) in ambient conditions. It was demonstrated that the optical band gap and electrical conductivity of S-RGO are easily tunable, and depend on the level of reduction and sulfonation of GO. Whereas, reduction and sulfonation were found dependent on SO3 content, acid strength, and gas tightness of the reaction mixture. It's actually the water content of oleum that determines the nature of the final product. The easily adjustable band gap and electrical conductivity suggest that S-RGO can be employed as a potential hole extraction layer (HEL) material for several donor-acceptor systems. For P3HT:PC61BM based inverted polymer solar cells, it was observed that the shape of the JeV curve is tailorable with the choice of HEL. Compared to a 2.75% power conversion efficiency (PCE) attained with PEDOT:PSS, a PCE of 2.80% was achieved with tuned S-RGO. Our results imply that an S-RGO of sufficiently high band gap and conductivity can replace some of the state of the art HEL materials for a host of device applications.
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Zuhair S. Khan,Hyung-Jin Kim,Yong-Wan Kim,Jae-Won Park 한국물리학회 2009 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.54 No.5
Hastelloy X, one of the Ni-based superalloys, is a promising candidate in various structural applications for high-temperature and corrosive environments. However, it is prone to environmental degradation in the iodine-sulfur cycle for nuclear hydrogen generation systems where the threat spectrum includes high temperature and pressure and corrosive gases based on sulfuric acid decomposition. In order to increase its tolerance, use of suitable coating materials is one option. Herein, a study has been made of electron-beam evaporative-coated and of ion-beam-mixed (IBM) SiC films on Hastelloy X coupons with intermediate Maxthal 211 (T2AlC) films. Cross-sectional trans- mission electron microscopy (X-TEM), scanning electron microscopy (SEM) and X-ray elemental mapping were performed on the coated and IBM samples. Preliminary studies of as-deposited and IBM coupons indicate a uniform and sound interface with some recoil implantation effects near the interface. In the case of coupons annealed in air at 1000℃ after the coating/IBM processing, severe interdiflusion from some of the proactive species into the coating and towards the substrate were found. The surfaces and the interfaces of the as-deposited coupons were characterized by an oxidation that was found to increase as a result of annealing. Hastelloy X, one of the Ni-based superalloys, is a promising candidate in various structural applications for high-temperature and corrosive environments. However, it is prone to environmental degradation in the iodine-sulfur cycle for nuclear hydrogen generation systems where the threat spectrum includes high temperature and pressure and corrosive gases based on sulfuric acid decomposition. In order to increase its tolerance, use of suitable coating materials is one option. Herein, a study has been made of electron-beam evaporative-coated and of ion-beam-mixed (IBM) SiC films on Hastelloy X coupons with intermediate Maxthal 211 (T2AlC) films. Cross-sectional trans- mission electron microscopy (X-TEM), scanning electron microscopy (SEM) and X-ray elemental mapping were performed on the coated and IBM samples. Preliminary studies of as-deposited and IBM coupons indicate a uniform and sound interface with some recoil implantation effects near the interface. In the case of coupons annealed in air at 1000℃ after the coating/IBM processing, severe interdiflusion from some of the proactive species into the coating and towards the substrate were found. The surfaces and the interfaces of the as-deposited coupons were characterized by an oxidation that was found to increase as a result of annealing.
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Enhanced Interfacial Reaction of SiC Films Deposited onto Hastelloy X Substrates by Ion-Beam Mixing
Jae-Won Park,Zuhair S. Khan,김형진,Yong-Wan Kim 한국물리학회 2009 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.54 No.5
A surface modification of Hastelloy X by a SiC coating and an ion-beam mixing has been studied. The deposited SiC film is easily peeled off during heating at elevated temperatures; however, the SiC coating on Hastelloy X with ion-beam mixing (IBM) is sustained at elevated temperatures above 900℃. The mechanism of good adhesion at the interface seems to be an interfacial reaction induced by ion-beam mixing, as revealed by cross-sectional transmission electron microscopy (XTEM), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), cross-sectional scanning electron microscopy (X-SEM) and Energy dispersive X-ray fluorescent spectroscopy (EDS). IBM plays a role of fastening the SiC film onto the Hastelloy X substrate until an interfacial reaction takes place. This study has been motivated by a SiC protective coating on a Hastelloy X (a Ni-Cr based alloy) substrate, which has potential applications in an extremely corrosive environment, such as an SO2/SO3 ambience, at temperatures higher than 900℃.
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