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RISS 인기검색어
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- 저자 : Rahman Taqi ur (검색결과 1 건)
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Chlorodifluoromethane (R22) Gas and Its Mixtures with CO2/N2/Air as an Alternative to SF6
Saleem Muhammad Zaheer,Kamran Muhammad,Amin Salman,Ullah Rahmat,Abbas Kharal Hafiz Shafqat,Nasimullah,Muhammad Fazal,Rahman Taqi ur 대한전기학회 2021 Journal of Electrical Engineering & Technology Vol.16 No.3
SF 6 has been extensively deployed in high voltage gas insulated equipment to be used as a dielectric medium since 1960 because of its excellent dielectric strength and arc interruption performance. This research proposes promising substitute of SF 6 , by investigating a refrigerant gas such as Chlorodifl uoromethane (CHClF 2 ) with a mixture of CO 2 /N 2 /Air to mitigate environmental hazards of SF 6 . R 22 has less atmospheric life and low cost as compared to SF 6 . It has less GWP (1,810) as compared to SF 6 (23,900). In this research, the AC and DC breakdown properties of R 22 mixtures along with varying ratios of CO 2 , N 2, and Air were investigated. The best alternative to SF 6 has been found to be a mixture of R 22 + N 2 which is close to 81% of SF 6 dielectric strength. The dielectric strength of diff erent optimal mixtures was found in the order of SF 6 > R 22 + N 2 > R 22 + Air > R 22 + CO 2 under AC voltage at 0.4 MPa. Moreover, the boiling point and GWP were further reduced by adding the buff er gases such as N 2, , CO 2 , and Air. R 22 also has acceptable insulation self-recoverability and liquefaction temperature. The results of this study are promising in terms of low cost and environment-friendly alternative to SF 6 .
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