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Operation and Maintenance of In-Situ CO₂ Measurement System Using Unmanned Aerial Vehicles
Kohei Nomura,Hirokazu Madokoro,Takashi Chiba,Makoto Inoue,Takeshi Nagayoshi,Osamu Kiguchi,Hanwool Woo,Kazuhito Sato 제어로봇시스템학회 2019 제어로봇시스템학회 국제학술대회 논문집 Vol.2019 No.10
The aim of this study is to actualize an in-situ measurement system of greenhouse gases using a UAV. This paper presents vertical profiles of CO₂ concentration as a measurement result with operation and long-term maintenance for a periodic flight tests. For this study, a new joint part with a single structure for improving strength of the sensor mount is developed. Moreover, routine maintenance to replace a router and periodic regulation of the analyzer is provided. After updating flight altitude permission over 150 m, we conducted flight tests up to 500 m. We compare individual linear correction and liner regression applied for vertical profiles of CO₂ concentration. We address that correction using linear regression has advantage to reduce burden for in-situ measurement.
Deposition Profile Control of Carbon Films on the Surface of Fine Structures using Plasma CVD
Kzunori Koga,Takuya Nomura,Masaharu Shiratani,Yuichi Setsuhara,Makoto Sekine,Masaru Hori 한국표면공학회 2010 한국표면공학회 학술발표회 초록집 Vol.2010 No.11
Deposition profile of DLC and a-C:H films in trenches is one of the concerns to realize coatings on patterned substrates. We have succeeded in controlling deposition profile of Cu in trenches for nano-fabrications, and have realized sub-conformal, conformal and anisotropic deposition. We are applying the deposition profile control method to carbon films in trenches. Deposition rate increases with decreasing the substrate temperature, because carbon etching rate by H atoms decreases with decreasing the substrate temperature. Deposition rate on sidewall and that on bottom decrease with increasing aspect ratio, while deposition rate on top little depends on the aspect ratio. The results suggest that the deposition profile can be controlled by changing deposition condition.