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Magnetic Property and Structure of Electrodeposited Nickel on a Thin Niobium Film
Huei-Ying Ho,Shih-Jia Chen,Wei-Yan Lin,Hong-Wen Cheng 한국물리학회 2013 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.62 No.12
Cyclic voltammetry, chronopotentiometry, atomic force microscopy (AFM), the magneto-opticalKerr effect (MOKE), and X-ray diffraction were used to investigate the magnetic property and thestructure of thin Ni films electrodeposited onto thin Nb films. A constant-current method was usedto grow the Ni films in this study. We found that -Ni(OH)2 coexists with the Ni deposits. The Nigrains favor growing along the polar direction the very early deposition stage; they tend to growin the lateral direction during the steady-state deposition process. The preferred orientations ofthe Ni deposits are fcc (111) and fcc (200); however, the easy axis of the magnetization of the Nideposits is in the in-plane direction. Increasing the deposition current can decrease the coercivity. We used the AFM and MOKE results to determine the mechanism of the growth of the Ni deposits. We found that the growth modes of the Ni deposits in the polar and the lateral directions largelycorresponded to the direct reduction of Ni and the decomposition of -Ni(OH)2, respectively.