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DC 마그네트론 스퍼터링법에 의해 제조한 TiNi 박막의 증착조건에 관한 연구
최대철(Dae Cheol Choi),한범교(Beom Gyo Han),남태현(Tae Hyun Nam),안효준(Hyo Jun Ahn) 한국수소및신에너지학회 1999 한국수소 및 신에너지학회논문집 Vol.10 No.4
In order to investigate the possibilities of microbatteries using TiNi type metal hydride, TiNi films were prepared by DC magnetron sputtering. The films were deposited under various Ar flow rates, DC powers and target-to-substrate distances to find the optimum sputtering conditions. The deposition rate of TiNi thin film increased by increasing the DC power and by decreasing the Ar flow rate and target-to-substrate distance. The chemical composition of the film changed as a target-to-substrate distance. The crystal structure of the film was amorphous state just after deposition and changed to crystalline by vacuum heat treatment.