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신영식,김문일 ( Y . S . Shin,M . I . Kim ) 한국열처리공학회 1990 熱處理工學會誌 Vol.3 No.1
In this study, TiN film was deposited onto steel by R.F.-PACVD in order to investigate the influence of parameters on the adhesion strength between film and substrate. Experimental results showed that adhesion strength by SAT is different from by optical microscopy. Adhesion strength is increased when the deposition temperature increases and is influenced by R.F. power and electrode distance. Especially heat treatment on the substrate has influenced over the adhesion strength, so it showed the 22 Newtons in adhesion strength by SAT and adhesion strength is decreased when deposition thickeness is thick and hardness is high. Also if the film is thick and high hardness simultaneous, the film was delaminated seriously.
조형연(H. Y. Cho),강태환(T. H. Kang),오정훈(J. H. Oh),구태홍(T. H. Goo),서인영(I. Y. Suh),심은보(E. B. Sim),송창영(C. Y. Song),신영식(Y. S. Shin) 전력전자학회 2010 전력전자학술대회 논문집 Vol.2010 No.7
전기자동차 충전 인프라 구축은 스마트 그리드사업과 연계하여 스마트 트랜스포테이션(Smart Transportation)이라는 새로운 사업모델로 활발히 추진되고 있다. 충전인프라 구축은 전력망, 운영시스템, 과금 및 정산 시스템과 급속충전기로 구성된다. 스마트 트랜스포테이션 제주 실증단지 구축사업(한전 컨소시움)에 설치 운영 될 급속충전기의 HMI(Human Machine Interface), BMS 인터페이스, 운영알고리즘에 대하여 소개하고자 한다.
플라즈마 화학증착법 ( PACVD )에 의한 TiN증착시 증착변수가 미치는 영향 (2) -TiCl4 , N2의 입력분율을 중심으로-
이병호,신영식,김문일 ( B . H . Rhee,Y . S . Shin,M . I . Kim ) 한국열처리공학회 1989 熱處理工學會誌 Vol.2 No.4
To investigate the influence of TiCl₄, N₂inlet fraction on the TiN layer, TiN film was deposited onto the STC3 and STD11 steel from gas mixtures of TiCl₄/N₂/H₂by the radio frequency plasma assisted chemical vapor deposition. The films were deposited at various TiCl₄, N₂inlet fractions. The results showed that the film thickness was increased with TiCl₄, inlet fraction. However, while the thickness was increased with N₄inlet fraction under 0.4 the thickness was decreased with increasing N₂ inlet fraction over 0.4. The density of deposited films was varied as TiCl₄, N₂ inlet fraction and its maximum value was about 5.6g/㎤. The contents of chlorine were increased with increasing TiCl₄inlet fraction and nearly constant with increasing N₂inlet fraction.
플라즈마 화학증착법에서 증착변수가 TiN 증착에 미치는 영향(III) -r.f. power 및 전극간 거리를 중심으로-
김충환,신영식,김문일,Kim, C.H.,Shin, Y.S.,Kim, M.I. 한국열처리공학회 1990 熱處理工學會誌 Vol.3 No.1
To investigate the influence of r.f. power and electrode distance on the TiN deposition, TiN films were deposited onto STC3, STD11 steel and Si-wafer from gas mixtures of $TiC_4/N_2/H_2$ using the radio frequency plasma assisted chemical vapor deposition. The crystallinity of TiN film could be improved by the increase of r.f. power and the decrease of electrode distance. The TiN coated layer contains chlorine, its content were decreased with increasing r.f. power as well as decreasing electrode distance. And the thickness of deposited TiN was largely affected by r.f. power and electrode distance. The hardness of deposited TiN reached a maximum value of about Hv 2,000.
Titaniun Interlayer가 TiN 박막의 밀착특성에 미치는 영향
공성호,김홍유,신영식,김문일 ( S . H . Kong,H . W . Kim,Y . S . Shin,M . I . Kim ) 한국열처리공학회 1992 熱處理工學會誌 Vol.5 No.1
In order to improve adhesive force of TiN film, we sputtered titanium as interlayer before TiN deposition by Plasma Enhanced Chemical Vapour Deposition. We observed changes of hardness and adhsion at a various thickness of titanium interlayer and also examined analysis. At the critical thickness of the titanium interlayer(about 0.2㎛) , adhesive force of TiN films were promoted mostly. But over the critical thickness, a marked reduction of adhesive force was showed, because of the internal stress of titanium interlayer. From AES analysis, the adhesion improvement of TiN films was mainly caused by nitrogen diffusion into titanium interlayer during TiN deposition process which relieved stress concentration at TiN coating-substrate interface.
마이크로 컴퓨터를 이용한 헤테로다인 광통신시스템의 LD편광제어기 설계
申榮植,田光錫,洪玩憲 서울시립대학교 산업기술연구소 1993 산업기술연구소논문집 Vol.1 No.-
Polarization state has been an important problem to solve to increase receiving sensitivity when the receive beam and the local beam are mixed in a heteroyne optical communication system. Therefore, in heterodyne optical receiver, a polarization - state control scheme is necessary. In this paper, the controller of polarization state using a microcomputer in heterodyne optical communication system was developed and implemented. We calculate the control signal determining the direction of stepping motors by using a microcomputer after matching the polarization state through the fiber and the linear polarization state, After applying the artificial disturbances to fiber, we show that how fastly Rotatable Fiber Cranks respond to maximum power using Peak - Search method and finally implement the receiver which always maintains maximum power. Output and polarization angle are slightly fluctuation at uncontrolled state, but they maintain very stable states at controlled steady state, and represent 2.5 seconds response time with respect to artificial disturbance during about 1 second.
신영식,김문일,김충환 한국열처리공학회 1990 熱處理工學會誌 Vol.2 No.4
To investigate the influence of r.f, power and electrode distance on the TiN deposition, TiN films were deposited onto STC3, STD11 steel and Si-wafer from gas mixtures of TiC₄/N₂/H₂using the radio frequency plasma assisted chemical vapor deposition. The crystallinity of TiN film could be improved by the increase of r.f, power and the decrease of electrode distance. The TiN coated layer contains chlorine, its content were decreased with increasing r.f. power as well as decreasing electrode distance. And the thickness of deposited TiN was largely affected by r.f. power and electrode distance. The hardness of deposited TiN reached a maximum value of about Hv 2,000.