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Top-down 방식과 bottom-up 방식의 융합을 통한 블록공중합체 자기조립 나노구조 제어
김봉훈 ( Bong Hoon Kim ),정성준 ( Seong Jun Jeong ),신동옥 ( Dong Ok Shin ),박승학 ( Seung Hak Park ),이형민 ( Hyung Min Lee ),구종민 ( Chong Min Koo ),김상욱 ( Sang Ouk Kim ),( Guo Dong Xia ) 대한금속재료학회 ( 구 대한금속학회 ) 2007 ELECTRONIC MATERIALS LETTERS Vol.3 No.3
The self-assembled nanostructures of block copolymers have been widely investigated because of their potential applications as templates for nanocomposites, optoelectronic devices, ultrahigh density nanodots or nanowire arrays, memory and capacitor devices, sensors, etc. Despite the advantages of block copolymer self-assembly such as parallel processing, molecular level resolution, and the capability to generate three dimensional structure, the lack of long range order of the block copolymer nanostructure have prevented the application to practical devices. Here, we review the strategy to combine top-down and bottom-up approaches as the method to obtain a block copolymer nanostructure with long range ordering. ``Graphoepitaxy`` and ``epitaxial self-assembly`` are demonstrated as the most successful strategies for well-ordered block copolymer nanostructures.