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나노초 및 피코초 레이저를 이용한 FPCB의 절단특성 분석
신동식(Dongsig Shin),이제훈(Jaehoon Lee),손현기(Hyonkee Sohn),백병만(Byoungman Paik) 한국레이저가공학회 2008 한국레이저가공학회지 Vol.11 No.4
Ultraviolet laser micromachining has increasingly been applied to the electronics industry where precision machining of high-density, multi-layer, and multi material components is in a strong demand. Due to the ever-decreasing size of electronic products such as cellular phones, MP3 players, digital cameras, etc., flexible printed circuit board (FPCB), multi-layered with polymers and metals, tends to be thicker. In present, multi-layered FPCBs are being mechanically cut with a punching die. The mechanical cutting of FPCBs causes such defects as burr on layer edges, cracks in terminals, delamination and chipping of layers. In this study, the laser cutting mechanism of FPCB was examined to solve problems related to surface debris and short-circuiting that can be caused by the photo-thermal effect. The laser cutting of PL and FCCL, which are base materials of FPCB, was carried out using a pico-second laser(355nm, 532nm) and nano-second UV laser with adjusting variables such as the average/peak power, scanning speed, cycles, gas and materials. Points which special attention should be paid are that a fast scanning speed. low repetition rate and high peak power are required for precision machining.
나노 복화(複畵)공정을 이용한 직접적 패터닝에 관한 연구
박상후(Sang Hu Park),임태우(Tae Woo Lim),양동열(Dong-Yol Yang),이신욱(Shin Wook Yi),공홍진(Hong Jin Kong) 대한기계학회 2003 대한기계학회 춘추학술대회 Vol.2003 No.11
A method of patterning submicron detailed figures, called as a nano replication printing (nRP), with two-photon-absorbed polymerization initiated by a femtosecond Ti:sapphire laser is proposed. In this method, the laser is scanned on a photosensitive urethane acrylate monomer resin, to induce photo-polymerization by two photon absorption along the rows of a voxel matrix transformed from a bitmap picture. The replicated figures with various dimensions, including sizes down to ~ 15 ㎛, can be fabricated experimentally with edge resolution of around 200㎚. Through the nRP process, the nano/micro-scaled direct patterning without any mask using a black-and-white type of bitmap file can be technologically feasible. The effectiveness of the proposed process has been verified by pattering several figures.