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Marichy, Catherine,Tessonnier, Jean-Philippe,Ferro, Marta C.,Lee, Kyeong-Hwan,Schlö,gl, Robert,Pinna, Nicola,Willinger, Marc-Georg The Royal Society of Chemistry 2012 Journal of materials chemistry Vol.22 No.15
<P>The chemical inertness of graphite and, in the case of tubes, of rolled up few layer graphene sheets, requires some degree of “defect engineering” for the fabrication of carbon based heterostructured materials. It is shown that atomic layer deposition provides a means to specifically label anchoring sites and can be used to characterize the surface functionality of differently treated carbon nanotubes. Direct observation of deposited titania by analytical transmission electron microscopy reveals the location and density of anchoring sites as well as structure related concentrations of functional groups on the surface of the tubes. Controlled functionalization of the tubes therefore allows us to tailor the distribution of deposited material and, hence, fabricate complex heterostructures.</P> <P>Graphic Abstract</P><P>Atomic layer deposition provides a means to specifically label anchoring sites of differently treated carbon nanotubes, paving the way to complex heterostructures fabricated <I>via</I> controlled surface functionalization. <IMG SRC='http://pubs.rsc.org/services/images/RSCpubs.ePlatform.Service.FreeContent.ImageService.svc/ImageService/image/GA?id=c2jm00088a'> </P>
Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications
Marichy, Catherine,Bechelany, Mikhael,Pinna, Nicola WILEY‐VCH Verlag 2012 Advanced Materials Vol.24 No.8
<P><B>Abstract</B></P><P>Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly developed from a niche technology to an established method. It proved to be a key technology for the surface modification and the fabrication of complex nanostructured materials. In this Progress Report, after a short introduction to ALD and its chemistry, the versatility of the technique for the fabrication of novel functional materials will be discussed. Selected examples, focused on its use for the engineering of nanostructures targeting applications in energy conversion and storage, and on environmental issues, will be discussed. Finally, the challenges that ALD is now facing in terms of materials fabrication and processing will be also tackled.</P>
Marichy, Catherine,Donato, Nicola,Willinger, Marc‐,Georg,Latino, Mariangela,Karpinsky, Dmitry,Yu, Seung‐,Ho,Neri, Giovanni,Pinna, Nicola WILEY‐VCH Verlag 2011 Advanced functional materials Vol.21 No.4
<P><B>Abstract</B></P><P>A new atomic layer deposition (ALD) process for nanocrystalline tin dioxide films is developed and applied for the coating of nanostructured materials. This approach, which is adapted from non‐hydrolytic sol‐gel chemistry, permits the deposition of SnO<SUB>2</SUB> at temperatures as low as 75 °C. It allows the coating of the inner and outer surface of multiwalled carbon nanotubes with a highly conformal film of controllable thickness. The ALD‐coated tubes are investigated as active components in gas‐sensor devices. Due to the formation of a p‐n heterojunction between the highly conductive support and the SnO<SUB>2</SUB> thin film an enhancement of the gas sensing response is observed.</P>
Marichy, Catherine,Deché,zelles, Jean-Francois,Willinger, Marc-Georg,Pinna, Nicola,Ravaine, Serge,Vallé,e, Renaud Royal Society of Chemistry 2010 Nanoscale Vol.2 No.5
<P>Combining both electromagnetic simulations and experiments, it is shown that the photonic pseudo band gap (PPBG) exhibited by a silica opal can be fully controlled by Atomic Layer Deposition (ALD) of titania into the pores of the silica spheres constituting the opal. Different types of opals were assembled by the Langmuir–Blodgett technique: homogeneous closed packed structures set up of, respectively, 260 and 285 nm silica spheres, as well as opal heterostructures consisting of a monolayer of 430 nm silica spheres embedded within 10 layers of 280 nm silica spheres. For the stepwise infiltration of the opals with titania, titanium isopropoxide and acetic acid were used as metal and oxygen sources, in accordance with a recently published non-aqueous approach to ALD. A shift of the direct PPBG, its disappearance, and the subsequent appearance and shifting of the inverse PPBG are observed as the opal is progressively filled. The close agreement between simulated and experimental results is striking, and promising in terms of predicting the properties of advanced photonic materials. Moreover, this work demonstrates that the ALD process is rather robust and can be applied to the coating of complex nanostructures.</P> <P>Graphic Abstract</P><P>Non-aqueous sol–gel chemistry applied to atomic layer deposition was used to impregnate silica opals, fabricated by the Langmuir–Blodgett technique, in order to tune their photonic band gap properties. <IMG SRC='http://pubs.rsc.org/services/images/RSCpubs.ePlatform.Service.FreeContent.ImageService.svc/ImageService/image/GA?id=b9nr00220k'> </P>