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제품 설계 지원을 위한 디지털 마이스터 전문가 시스템의 설계
강해운(H. W. Kang),남성호(S. H. Nam),홍원표(W. P. Hong),이석우(S. W. Lee),최헌종(H. J. Choi) 한국정밀공학회 2005 한국정밀공학회 학술발표대회 논문집 Vol.2005 No.10월
Recently We make a study of the process expert system model in 2005. Process expert system concepts is applied to the digital meister expert system development. Well-designed expert systems imitate the reasoning processes experts use to solve specific problem. Specially, expert systems are used to the engineer in manufacturing industry for the process control, production management and system management. In this paper, we propose the digital meister expert system for product design process in manufacturing industry and we present introduction and contents of design process expert system methodology and software for the air purifier design system.
강은구(E.G. Kang),최병열(B.Y. Choi),이석우(S. W. Lee),홍원표(W.P. Hong),최헌종(H.Z. Choi) 한국정밀공학회 2004 한국정밀공학회 학술발표대회 논문집 Vol.2004 No.10월
The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper was carried out some experiments and verifications of mechanism on FIB-CVD using SMI8800 made by Seiko. FIB-CVD has in fact proved to be commercially useful for repair processes because the beam can be focused down to 0.05㎛ dimensions and below and because the same tool can be used to sputter off material with sub-micrometer precision simply by turning off the gas ambient. Recently the chemical vapour deposition induced ion beam has been required more deposition rate and accurate pattern because of trying to manufacture many micro and nano parts. Therefore this paper suggested the optimization parameters and discussed some mechanism of chemical vapour deposition induced ion beam on FIB-CVD for simple pattern.
강은구(E. G. Kang),최병열(B. Y. Choi),홍원표(W. P. Hong),이석우(S. W. Lee),최헌종(H. Z. Choi) 대한기계학회 2006 대한기계학회 춘추학술대회 Vol.2006 No.6
Recenlty, FIB-CVD processes have being applied to another micro-manufacturing field such as semi-conductor industries, display industries and IT industries etc because it have some features that are available to fabricate the micro 3d shape structure directly and are possible to achieve the more minimum structure size than another machining process. In this paper, in order to analyze the FIB-CVD mechanism, we tried to suggest two models relating to the concentration effect of the radical of the precursor and the effect of the physically self-bais potential energy difference of its radical. Finally, we give the conclusion on discussion of the FIB-CVD mechanism suggested and the characteristics of FIB-CVD according to two models through some experiments.
홍원표(W. P. Hong),최병열(B. Y. Choi),강은구(E. G. Kang),이석우(S. W. Lee),최헌종(H. Z. Choi) 대한기계학회 2008 대한기계학회 춘추학술대회 Vol.2008 No.5
FIB has been commonly used as a very powerful tool in the semiconductor industry. It is mainly used for mask repair, device correction, failure analysis and IC error correction, etc. Currently, FIB is not being applied to the fabrication of the micro and nano-structured mold, because of low productivity. And also sputtering rate has been required to fabricate 3D shape. In this paper, we studied the FIB-Sputtering rate according to mold materials. As well, surface roughness characteristics were analyzed for micro and nano mold fabrication. The micro Si wafer, GC (Glassy Carbon), STAVAX, and DLC that have been normally considered as good micro or nano mold materials were used in this study. The experiment object of waveguide mold is also applied to the DLC material.