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SIL 기반 플라즈모닉 리소그래피에서 주파수 적응형 필터를 이용 한 나노간극 제어의 성능향상
최국종 ( Guk Jong Choi ),임건 ( Geon Lim ),박노철 ( No Cheol Park ) 정보저장시스템학회 2014 정보저장시스템학회논문집 Vol.10 No.1
Plasmonic lithography is the latest technique to overcome diffraction limit of previous optical lithography. In the plasmonic lithography, the nano gap between nano metal wave guide and photoresist should be in sub-wavelength region. SIL-based plasmonic lithography is the one of the solutions to maintain small air gap. However, the nano gap control is so sensitive that a little disturbance is able to have a large effect on the nano gap control. So, we analyzed the characteristics of disturbance, and then modified the previous controller to suppress the disturbance. We applied two peak filters which were fixed one and adaptively changeable one. We experimentally confirmed the improvement of the nano gap control, which reduced nano gap error by 30 %. The proposed control will improve the quality of lithography pattern.