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나노인덴테이션을 이용한 나노 임프린트된 폴리머 박막의 잔류두께 측정기법
이학주(H.J. Lee),고순규(S.G. Ko),김재현(J.H. Kim),허 신(S. Hur),이응숙(E.S. Lee),정준호(J.H. Jeong) 대한기계학회 2003 대한기계학회 춘추학술대회 Vol.2003 No.11
Nano-imprint technology has been vigorously studied by many researchers for it is one of the<br/> most promising technologies for manufacturing the pattern with its critical dimension below 100nm. In<br/> the nano-imprint technology, nano patterns are transferred on a polymer film and the transferred<br/> patterns are used as an etch mask to define the designed patterns on a substrate or a metal layer. To<br/> this end, it is important to keep the residual thickness of the imprinted polymer film uniform. In this<br/> study, a novel measurement technique to measure the residual thickness of films is proposed based on<br/> nanoindentation theory. This technique has advantages of saving time and measuring the residual<br/> thickness of highly-localized portions in comparison with other techniques, but has limitation of<br/> requiring calibration process.