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임재성(J.S. Lim),신백균(P.K. Shin),남광우(K.Y. Nam),김진식(J.S. Kim),황명환(M.H. Hwang),김종택(J.T. Kim),이은학(Y.H. Lee),강대하(D.H. Kang) 대한전기학회 2006 대한전기학회 학술대회 논문집 Vol.2006 No.7
In this paper, poly methyl methacrylate thin films were deposited on a ITO glass substrate using a plasma polymerization technique. In order to investigate the influence of the plasma coupling method and plasma conditions on the plasma polymerized poly methyl methacrylate (ppMMA) thin film properties, inductively coupled (ICP) and capacitively coupled plasma (CCP) were used to generate the plasma and the plasma parameters were varied. Molecular structures of the ppMMAs were investigated using a Fourier Transform Infrared (IT-IR) spectroscopy. Dielectric constants of the ppMMA thin films were investigated using a impedance anaiyzer (HP4192A, LF Impedance Analyzer). Current-Voltage (I-V) characteristics of the ppMMA thin films were investigated using a source measurement unit (SMU : Keithley 2400). Relationship between the plasma coupling technique/process parameter and ppMMA thin films properties were investigated.