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데이터 처리를 통한 테라헤르츠 (THz) 파의 2차원 이미지 개선
손채화,진윤식,전석기,김근주,정순신,정원용,Shon, Chae-Hwa,Jin, Yun-Sik,Jeon, Seuk-Gy,Kim, Keun-Ju,Jung, Sun-Shin,Yong, Chong-Won 한국광학회 2005 한국광학회지 Vol.16 No.6
테라헤르츠(terahertz: THz) 파를 이용한 2차원(2D) 투과 이미지의 개선 특성에 대해서 보고한다. THz 파 투과 신호의 진폭과 위상을 이용하여 다양한 시료에 대한 2차원 이미지를 얻었다. THz 파의 진폭과 위상 정보를 조합하는 새로운 방법을 제안하였고, 이 방법을 이용하여 피크 값의 크기 혹은 위상 중 어느 한가지만을 이용한 이미지보다 나은 이미지를 얻을 수 있었다. 또한 호모몰픽 필터링(homomorphic filtering) 디지틸 이미지 처리(digital image processing) 가 노이즈를 저감시키는데 효율적이고 나은 품질의 이미지도 얻을 수 있음을 보인다. 이 결과를 이용하여 향후 실시간 이미징에 응용 가능하다. Two-dimensional (2D) images that are produced by terahertz (THz) irradiation we presented. It is possible to obtain 2D image of various materials by observing the amplitude and the phase of the THz signals which go through them. Better images are produced by combining the amplitude and phase of the signal rather than using only one of these. Homomorphic filtering that is one elf the well-known technique of digital image signal processing is effective to reduce the noise signal and can provide better quality images. The results can be applied to real-time imaging afterwards.
RF 플라즈마 및 전기장의 흑색종 (G361 melanoma) 세포에 대한 사멸 효과
孫采化(Shon Chae-Hwa),金奎千(Kim Gyoo-Cheon),李海準(Lee Hae June) 대한전기학회 2007 전기학회논문지 Vol.56 No.11
Micro plasma has been recently studied to investigate the effects on various cells. We study a micro-plasma produced by a plasma needle that is operated with RF power and its effects on G361 melanoma cells. The micro plasma size ranges from sub-㎜ to several mm at a few watts of RF power. For the bio-medical treatment, low-temperature plasma is obtained and gas temperature is controlled within several tens of degrees (℃) in order not to disturb cell activities. Elementary spectroscopic studies to obtain plasma characteristics are presented for Ar and He plasma with different frequencies of RF power. Also the preliminary results of the micro plasma effects on G361 melanoma cells are presented. It was observed that the irradiation of micro plasma induces cell death through the deprivation of tyrosine phosphorylation in the G361 cells.
저 유전 재료의 에칭 공정을 위한 H₂/N₂ 가스를 이용한 Capacitively Coupled Plasma 시뮬레이션
孫采化(Chae-Hwa Shon) 대한전기학회 2006 전기학회논문지C Vol.55 No.12
The resistance-capacitance (RC) delay of signals through interconnection materials becomes a big hurdle for high speed operation of semiconductors which contain multi-layer interconnections in smaller scales with higher integration density. Low-k materials are applied to the inter-metal dielectric (IMD) materials in order to overcome the RC delay. Relaxation continuum (RCT) model that includes neutral-species transport model have developed to model the etching process in a capacitively coupled plasma (CCP) device. We present the parametric study of the modeling results of a two-frequency capacitively coupled plasma (2f-CCP) with N₂/H₂ gas mixture that is known as promising one for organic low-k materials etching. For the etching of low-k materials by N₂/H₂ plasma, N and H atoms have a big influence on the materials. Moreover the distributions of excited neutral species influence the plasma density and profile. We include the neutral transport model as well as plasma one in the calculation. The plasma and neutrals are calculated self-consistently by iterating the simulation of both species till a spatio-temporal steady state profile could be obtained.
Modeling of CCP plasma with H2/N2 gas
손채화(Chae-Hwa Shon) 대한전기학회 2006 대한전기학회 학술대회 논문집 Vol.2006 No.10
The resistance-capacitance (RC) delay of signals through interconnection materials becomes a big hurdle for high speed operation of semiconductors which contain multilayer interconnection layers. In order to reduce the RC delay. low- k materials will be used for inter-metal dielectric (IMD) materials. We have developed self-consistent simulation tool that includes neutral-species transport model, based on the relaxation continuum (RCT) model. We present the parametric study of the modeling results of a two-frequency capacitively coupled plasma (2f-CCP) with N₂/H₂ gas mixture that is known as promising one for organic low-k materials etching. We include the neutral transport model as well as plasma one in the calculation. The plasma and neutrals are calculated self-consistently by iterating the simulation of both species till a spatiotemporal steady state profile could be obtained.
침형 상압 마이크로 플라즈마 장치에서 발생하는 전기장이 세포 사멸에 미치는 효과
尹賢鎭(Hyun Jin Yoon),孫采化(Chae-Hwa Shon),金奎千(Gyoo-Cheon Kim),李海準(Hae June Lee) 대한전기학회 2008 전기학회논문지 Vol.57 No.12
A non-thermal micro-size plasma needle is applicable for medical treatment because it includes radicals, charged particles, ultraviolet emission, and strong electric fields. The electric fields around the plasma needle device driven by a radio frequency wave are investigated in order to calculate the power delivered to the cell. A commercial multi-physics code, CFD-ACE, was utilized for the calculation of electric fields for the optimization of the needle structure. The electric field and energy absorption profiles are presented with the variation of the device structure and the distance between the needle and tissues. The living tissues effectively absorb the radio frequency power from the plasma needle device with the covered pyrex structure.