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Characteristics of Plasma Etching and Plasma Diagnostics of $$CF_4$ Gas with Electric Probe
성영권,신동렬,최복길,권광호,Sung, Yung-Kwon,Shin, Dong-Ryul,Choi, Bok-Gil,Kwon, Kwang-Ho The Institute of Electronics and Information Engin 1986 전자공학회논문지 Vol.23 No.6
In this paper, the measurement of RF discharge plasma parameters is studied both analytically and experimentally by the electric probe method. In the measurement using an electric probe, we measure the parameters of plasma in CF4 etching gas and discuss the relations of the results and Si wafer etching. Also, we show that the electric probe method is attractive for various applications.
Corona pulse 검출에 의한 전력기기절연진단에 대한-고찰
성영권(Yung Kwon Sung),정성계(Sung Kae Chung),김왕곤(Wang Kwun Kim) 대한전기학회 1967 전기의 세계 Vol.16 No.5
This paper shows the analysis for mechanisms of corona pulse caused by dielectric breakdown, and for the results of observed values on an actual machines with the this corona pulse technique. Although the above results are not directly related with the generation, numbers or wave of the corona pulse, it may possibly be chanced a judgement of dielectric breakdown and one of better synthetic judgement methods for actual electrical machines.