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김규만(G. M. Kim),정성일(S.I. Chung),오현석(H.S. Oh) 한국정밀공학회 2004 한국정밀공학회 학술발표대회 논문집 Vol.2004 No.10월
Fabrication of a high-resolution shadow mask, or called nanostencil, is presented. This high-resolution shadowmask is fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. 500 ㎚ thick and 2x2 mm large membranes are made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. Subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to high resolution of FIB milling process, nanoscale apertures down to 70 ㎚ could be made into the membrane.
G. M. Kim(김규만),H. Khan(칸하룬),H. J. Choi(최혜진) Korean Society for Precision Engineering 2021 한국정밀공학회 학술발표대회 논문집 Vol.2021 No.11월
Microfluidic enzymatic biofuel cells (μEBFCs) have received significant research attention due to their feasibility to power implantable medical devices. However, typical two-streamflow channel in μEBFC limit their practicality. We propose a new approach to design the single-stream μEBFC based on their performance by placing electrodes at different positions in the microchannel. Multiwalled carbon nanotube (MWCNT) electrodes were produced by stencil method which were modified with glucose dehydrogenase and laccase via direct covalent bonding, for bioanode and biocathode, respectively. The best results were attained by placing the cathode at the top and anode at the bottom of the microchannel in a Y-shaped two streamflow μEBFC. With a single stream, we achieve more practicality, but the performance was reduced by 40%. However, 20% of this loss was recovered by applying a new design of electrodes i.e., anode at bottom and cathode at the top facing each other in the microchannel. This corresponds to maximum current and power density of 216 ± 12 μA.cm<SUP>-2</SUP> and 69.2 ± 9.2 μW.cm<SUP>-2</SUP>, respectively. When two devices were stacked, the maximum power density reached 160 μW.cm<SUP>-2</SUP> at 0.3 V. This study validates the feasibility of using single-stream μEBFCs to power microelectronics more simply and practically.
김규만(G. M. Kim),정성일(S. I. Chung),오현석(H.S. Oh) 한국정밀공학회 2005 한국정밀공학회 학술발표대회 논문집 Vol.2005 No.10월
FIB (Focused Ion Beam) milling on a 500-㎚-thick silicon nitride membrane was studied in order to fabricate a highresolution shadow mask, or called a nanostencil. The silicon nitride membrane was fabricated by MEMS processes of LPCVD, photolithography, ICP etching and bulk silicon etching. The apertures made by FIB milling and normal photolithography were compared. The square metal pattern deposited through FIB milled shadow mask showed 6 times smaller corner radius than the case of photolithography. The results show high resolution patterning could be achieved by local deposition through FIB milled shadow-mask.