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홍장후,신현진,김운겸,강경묵 서울産業大學校 1999 논문집 Vol.49 No.2
PVA/Algin blend films were prepared by solution blending method for the purpose of useful biodegradable polymer. Characteristics properties of blend films such as DSC, Elongation, Tensile strength and Morphological changes by SEM were determined. Tensile strength and Elongation were rapidly reduced as increasing the blend ratio of Algin. Blend films were found that phase separation was occured as more than 25wt% increasing the blend ratio of Algin. Blend films were observed to be less partially compatibility than 10wt% increasing the blend ratio of Algin by DSC, mechanical properties and SEM Also, Blend films at the laboratory soil test(Pot Test) were completely degraded in months with four kinds of soils by microganisms.
2-Fluorenylidene chalcone유도체에 대한 Thiourea의 친핵성 첨가반응에 관한 연구
강경묵,김낙주 서울産業大學校 1996 논문집 Vol.44 No.1
2-Fluorenylidene chalcone derivative were synthesized by condensation. The structure of these compounds were ascertained by means of UV, m.p, IR and 1H-NMR spectra. It was measured that nucleophilic addition of thiourea for 2-fluorenylidene chalcone made use of ultraviolet spectropho-tometery at a wide pH 1.0 ∼13.0 range in 20% dioxane-H₂O at 25℃. On the basis of general base catalysis substitutent effect, and confirmation of addtion reaction product, the nucleophilic addtion kinetics of thiourea for 2-fluorenylidene chalcone were measured by pH change. It maybe concluded that a part was unrelated to pH and another part was in proportion to concentration of hydroxide ion : Above pH 10.0, It was in propotion to concentration of hydroxide ion, a part having no concern with pH was added to the neutral thiourea molecule. From the results of measurement the reaction rate and these findings, nucleophilic addition of thiourea to 2-fluorenylidene chalcone derivative was proposed a fitting mechanism.
강경묵,홍장후,김운겸 서울産業大學校 1998 논문집 Vol.47 No.1
On this research, photosensitive photoresists of the positive for a printing plate were studied. First of all, PF, o-, m-, p-CF resins as a matrix resin were synthesized at an identical condition. Photoresist is defined as substance that makes chemical changes in its solubility, colouring and hardening by light energy. Photoresists were prepared by mixing NDS derivatives with a matrix resin at various mixing ratios. Characteristics of photoresists were studied by yield method of residual using NDS derivatives shows excellent photosensitivity and solubility compared with commercial product. The mixing ratio of 1:4(by mass) of NDS derivative[III] and m-CF resin shows the highest dissolution rate among others. In addition, photoresist was obtained at this condition resulted in the superior sensitivity and contrast.
강경묵,이수영,유승교 서울産業大學校 1998 논문집 Vol.47 No.1
The field if printing to use pressurized ink using screen gossamer that is called screen printing. Existing cleaning solvents for the screen printing have a bad effect to the environment which are the organic solvents containing aromatic compounds and stench. Also, cleaning method of screen printing affect the human body which are for the most part mixed cleaning method of dipping and polish. In this study, we measured the cleaning efficiency by gravimatric analysis and the property change of gossamer by image analyzer using existing cleaning solvent for the betterment of screen printing working environment. Also, we investigated an alternative cleaning process showing excellent cleaning efficiency using the ultrasonic and vibration cleaning method instead of the exsiting mixed cleaning method.