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Modification of argon impurity transport by electron cyclotron heating in KSTAR H-mode plasmas
Hong, Joohwan,Henderson, S.S.,Kim, Kimin,Seon, C.R.,Song, Inwoo,Lee, H.Y.,Jang, Juhyeok,Park, Jae Sun,Lee, S.G.,Lee, J.H.,Lee, Seung Hun,Hong, Suk-Ho,Choe, Wonho International Atomic Energy Agency 2017 Nuclear fusion Vol.57 No.3
<P>Experiments with a small amount of Ar gas injection as a trace impurity were conducted in the Korea Superconducting Tokamak Advanced Research (KSTAR) H-mode plasma (<img ALIGN='MIDDLE' ALT='${{B}_{\text{T}}}$ ' SRC='http://ej.iop.org/images/0029-5515/57/3/036028/nfaa5333ieqn001.gif'/> = 2.8 T, <img ALIGN='MIDDLE' ALT='${{I}_{\text{P}}}$ ' SRC='http://ej.iop.org/images/0029-5515/57/3/036028/nfaa5333ieqn002.gif'/> = 0.6 MA, and <img ALIGN='MIDDLE' ALT='${{P}_{\text{NBI}}}$ ' SRC='http://ej.iop.org/images/0029-5515/57/3/036028/nfaa5333ieqn003.gif'/> = 4.0 MW). 170 GHz electron cyclotron resonance heating (ECH) at 600 and 800 kW was focused along the mid-plane with a fixed major radial position of <img ALIGN='MIDDLE' ALT='$R$ ' SRC='http://ej.iop.org/images/0029-5515/57/3/036028/nfaa5333ieqn004.gif'/> = 1.66 m. The emissivity of the Ar<SUP>16+</SUP> (3.949 <img ALIGN='MIDDLE' ALT='${\mathring{\text{A}}}$ ' SRC='http://ej.iop.org/images/0029-5515/57/3/036028/nfaa5333ieqn005.gif'/>) and Ar<SUP>15+</SUP> (353.860 <img ALIGN='MIDDLE' ALT='${\mathring{\text{A}}}$ ' SRC='http://ej.iop.org/images/0029-5515/57/3/036028/nfaa5333ieqn006.gif'/>) spectral lines were measured by x-ray imaging crystal spectroscopy (XICS) and a vacuum UV (VUV) spectrometer, respectively. ECH reduces the peak Ar<SUP>15+</SUP> emission and increases the Ar<SUP>16+</SUP> emission, an effect largest with 800 kW. The ADAS-SANCO impurity transport code was used to evaluate the Ar transport coefficients. It was found that the inward convective velocity found in the plasma core without ECH was decreased with ECH, while diffusion remained approximately constant resulting in a less-peaked Ar density profile. Theoretical results from the NEO code suggest that neoclassical transport is not responsible for the change in transport, while the microstability analysis using GKW predicts a dominant ITG mode during both ECH and non-ECH plasmas.</P>
A new metrology system of organic additives in copper plating bath
Kimin Hong 한국물리학회 2003 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.43 No.2
Electrodeposition of copper in the semiconductor industry utilizes organic additives whose concentrations have a significant impact on the properties of the plated copper lms. Proper additives enable void-free trenches and vias for metallic interconnects. Since the additives are consumed during plating, replenishment based on a reliable metrology system is required to maintain a stable bath. We have developed a new metrology system by using a high performance liquid chromatography. This system has the advantage of simultaneous detection of multiple additive components at high speed. It has also demonstrated excellent accuracy and precision in measuring and controlling additive concentrations in production baths used in the semiconductor industry.
Performance of manual metrology systems for copper plating electrolytes
Hong, Kimin 충남대학교 기초과학연구소 2003 忠南科學硏究誌 Vol.30 No.1
Semiconductor industry has been using copper electroplating for fabrication of metallic interconnects. High quality copper film is obtained by utilizing proper inorganic electrolyte and appropriate organic additives. Establishment of stable plating process requires accurate and precise control of concentrations of chemical components in the plating bath. We have developed metrology methods of inorganic concentrations in copper plating bath by using a UV/VIS spectrophotometer and a titrator. It has demonstrated capability and versatility for analysis and control of plating baths. This system has demonstrated high precision and accuracy applicable to semiconductor industry. In this paper, requirements for the meterology systems, the measurement methods, and performance test results are presented.
Electrodeposition of Cobalt Nanowires
Ahn, Sungbok,Hong, Kimin Korean Chemical Society 2013 Bulletin of the Korean Chemical Society Vol.34 No.3
We developed an electroplating process of cobalt nanowires of which line-widths were between 70 and 200 nm. The plating electrolyte was made of $CoSO_4$ and an organic additive, dimethyldithiocarbamic acid ester sodium salt (DAESA). DAESA in plating electrolytes had an accelerating effect and reduced the surface roughness of plated cobalt thin films. We obtained void-free cobalt nanowires when the plating current density was 6.25 mA/$cm^2$ and DAESA concentration was 1 mL/L.
Multiple and Mass Transfer of Magnetic Particles for Use in Biosensors
Dongyeon Keum,Paengro Lee,Kimin Hong IEEE 2011 IEEE transactions on magnetics Vol.47 No.9
<P>We studied a method of collecting small magnetic particles on a narrow metallic wire and transferring them between wires by using magnetic fields of electrical currents. By applying currents to a grid pattern of wires in specified directions, we could adjust direction of thermal drift of the particles in a fluid. We could collect a large amount of particles on a wire at an elevated speed aided by the drift. Gradual changes of the currents in two parallel wires enabled us to transfer the particles between the wires at a fast rate. The transfer could be reversed multiple times by switching the direction of currents. The multiple and mass control of the magnetic particles could be used for high sensitivity biosensors.</P>
진공증착법에 의한 Bismuth Telluride 박막의 제작 및 물성
황삼규 ( Samgyu Hwang ),홍기민 ( Kimin Hong ) 충남대학교 기초과학연구원 2021 충남과학연구지 Vol.38 No.1
Bismuth Telluride(BiTe) is a material which is widely used in thermoelectric devices in the room temperature range because of its high conversion efficiency. We fabricated Bismuth Telluride thin films by using a thermal evaporation method and measured electrical resistivity of them from 80 K to 500 K. We also observed the effects of high temperature annealing of the films on the changes in electrical resistivity. By using X-ray diffraction and scanning electron microscopy-energy dispersive spectrometer, we investigated the crystallinity and composition of the BiTe thin films.
Magnetic Properties of Thin Cu / Co Multilayers Made by Electrodeposition
Jungju Lee,Jinhan Lee,Kimin Hong 한국자기학회 2005 Journal of Magnetics Vol.10 No.3
We have investigated the magnetic properties of electroplated thin Cu/Co multilayers by using electrolytes made of copper sulphate and cobalt sulphate and by applying alternating plating voltage. While the multilayers plated with pure electrolyte showed superparamagnetism, those plated with organic additives showed ferromagnetic behavior. These changes are attributed to the so-called “self-annealing” effect and reduction of grain size caused by the organic additives.