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      저자 : Huanxiong Xia (검색결과 1 건)
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        The array-control heater and non-uniform resistance module design for regulating the temperature profile in a reactor chamber

        Huanxiong Xia,Dong Xiang,Peng Mou 대한기계학회 2015 JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY Vol.29 No.2

        The process chamber is the core unit of chamber-category integrated circuit manufacturing equipment. The physical field distributionin the chamber directly determines the process quality, but flexible and refined regulation of the physical field is the severest difficultythe equipment design confronts. The actual process chamber is relatively rigid in general, and lacks enough degrees of freedom (DOF) toflexibly regulate the distribution of process factors. As a result, it is difficult to achieve refined regulation of the process quality of thelarge-area wafer. To solve this problem, a multi-DOF and flexible design concept for the spatial distribution of process factors was proposed,and based on this concept, two typical design solutions were presented. To solve this kind of high-DOF and physical field involveddesign problem, a generalized profile error feedback (PEF) method was established that employs an iterative-approximation modeand starts from an initial guessed model. Four operations, including error obtainment, weight matrix configuration, error distribution andcompensation, are in each iteration step. This iterative loop is run to make the current physical field profile in the critical domain continuouslyapproximate the expected profile. The two design solutions both achieved the flexible and refined regulation of the thermal fieldvia the PEF method. And under the condition of model-based simulation, the PEF method drove the current temperature profile to approximatethe expected one in the chamber, and found a design variables sequence to make the relative error reduce from 2.91~5.28% ofthe initial guessed model to 0.012~0.015%.

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