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R.F Magnetron Sputtering법으로 제조한 TiO<sub>2</sub> 박막의 특성
추용호,최대규,Chu Y. H.,Choi D. K. 한국재료학회 2004 한국재료학회지 Vol.14 No.11
Titanium oxide thin films were prepared on Si(100) substrates by R.F. magnetron reactive sputtering at $30\sim200watt$ R.F power range, and annealed at $600^{\circ}C\sim800^{\circ}C$ for 1 hour. The properties of $TiO_2$ thin films were analyzed using x-ray, ${\alpha}-step$, ellipsometer, scanning electron microscopy, and FT-IR spectrometer. Upon in-situ depositions, the initial phase of $TiO_2$ thin film showed non-crystalline phase at R.F. power $30\sim100$ watt. The crosssection of $TiO_2$ thin films were sbserved to be the columnar structure. With the increasing R.F power and annealing temperature, the grain size, crystallinity, refractive index, and void size of titanium oxides showed a tended to increase. The FT-IR transmittance spectra of titanium oxide thin films have the obsorption band of Ti-O bond, Si-O bond, Si-O-Ti bond and O-H bond. With the increase of R.F. power and annealing temperature, these films have the stronger bond structures. It is considered that such a phenomena is due to phase transition and good crystallinity
이정호(J.H.Lee),최대규(D.K.Choi),최상돈(S.D.Choi),최해영(H.Y.Choi),원충연(C.Y.Won),김수석(S.S.Kim) 전력전자학회 2003 전력전자학술대회 논문집 Vol.2003 No.7(1)
When ICP(Inductive Coupled Plasma) type etching and wafer manufacturing is being processed m semiconductor process, a noxious gas in PFC and CFC system is generated Gas cleaning dry scrubber is to remove This noxious gas. This paper describes a power source device, 2MHz switching frequency class 2kW RF Generator, used as a main power source of the gas cleaning dry scrubber. The power stage of DC/DC converter is consist of full bridge type converter with 100kHz switching frequency. Power amplifier is push pull type inverter with 2MHz switching frequency, and transmission line transformer The adequacy of the circuit type and the reliability of generating plasma In various load conditions are verified through 50Ω dummy load and chamber experiments result
RF 발생기용 고성능 능동 클램프 ZVS 플라이백 컨버터에 관한 연구
이우석(W.S.Lee),김준호(J.H.Kim),원충연(C.Y.Worn),최대규(D.K.Choi),최상돈(S.D.Choi),김수석(S.S.KIM) 전력전자학회 2001 전력전자학술대회 논문집 Vol.2001 No.7
This paper deals with the active clamp ZVS flyback converter for RF generator. The proposed converter has the characteristics of the low switching noise and high efficient regarding conventional flyback converter. To verify validity of the proposed converter, the 100kHz, 48V, 300W converter are simulation and experimental result. This converter will be apply to the discharge drive circuit for PDP(Plasma Display Panel) TV.
리모트 프라즈마 전원용 하프 브리지 인버터의 운전 특성
김수석(S.S. Kim),원충연(C.Y. Won),최대규(D.K. Choi),최상돈(S.D. Choi) 전력전자학회 2003 전력전자학술대회 논문집 Vol.2003 No.7(2)
In this paper, a operation characteristics and analysis of the HB(half bridge) inverter for remote plasma system arc studied. the remote plasma system is cleaning system for the chemical vapor deposition (CVD) chamber in semiconductor processing. The remote plasma system is powered by the RF generator. The main power stage of the RF generator is used for the HB PWM inverter with an low pass filter in the secondary circuit of the transformer. The detailed mode analysis of HB inverter was described. The operation characteristics of Remote Plasma Source arc verified by simulation and experimental results.<br/>