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장원석(Wonseok Chang),최무진(Moojin Choi),김재구(Jaegu Kim),조성학(Sunghak Cho),황경현(Kyunghyun Whang) 대한기계학회 2003 대한기계학회 춘추학술대회 Vol.2003 No.11
Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated for applications as molecular recognition, selective binding of enzyme to surfaces, coating layer for corrosion protections or friction reduction and in fabrication of micro structure of bio molecular. In this study, standard positive photoresist techniques were adapted to generate micro/nano patterns of gold film using SAMs and femtosecond laser (200fs). SAMs formed by the adsorption of alkanethiols onto gold substrate with 100㎚ thickness are employed as very thin photoresist. We present the fabrication of thin film that has heterostructure of two different kinds of thiol by maskless laser patterning of organic SAMs. And this method also extend to nanoscale patterning using near-field scanning optical microscopy coupled with femtosecond laser.
클로로메틸 폴리이미드(CMPI) 박막과 근접장 나노 프로브 레이저 패터닝을 이용한 미세 형상 가공 기술
최무진(Moo Jin Choi),장원석(Wonseok Chang),김재구(Jaegu Kim),조성학(Sunghak Cho),황경현(Kyunghyun Whang ) 한국정밀공학회 2004 한국정밀공학회 학술발표대회 논문집 Vol.2004 No.10월
Photo-induced surface alignment is charming as a non-contact photo-patternable alignment technology which can be used in the next generation of displays, such as large area, multi-domain. For decades, many polymer film have been investigated and developed to be used in the photo alignment. Among these photoreactive materials, recently developed polyimide, Chloromethylated Polyimide(CMPI) now became the focus of interests in this area because of its high photosensitivity and superior thermal stability. In this report, we present micro patterning method to form the nanoscale structure by Mask-Less laser patterning using this CMPI film and NSOM probe.
김재구(Jaegu Kim),조성학(Sunghak Cho),장원석(Wonseok Chang),나석주(Suck-Joo Na),황경현(Kyunghyun Whang) 한국레이저가공학회 2007 한국레이저가공학회지 Vol.10 No.4
In this paper, we suggested the femtosecond laser processing using the mask which makes Gaussian spatial beam distribution to a normalized distribution by Fresenel diffraction. Holography pattern of the size of 320 × 320 ㎛² on the Cr thin film on glass substrate with a pixel size of 5 × 5 ㎛² was fabricated according to the pattern generated by the iterative Fourier transform algorithm (IFTA) algorithm. We analysed the damage threshold with an assumption the power distribution as Gaussian profile as 45 mJ/㎠, The regenerated image of letters through the diffractive pattern was well recognized at the screen.