방사선치료계획에 따른 뇌하수체 종양의 선량분포 비교

우홍 慶山大學校 1994 論文集 Vol.12 No.1

In the radiation treatment planning of pituitary tumors, we compared the dose distributions in target volume and surrounding normal tissues to the conventional seven treatment plans. In the case of irradiation to 100cGy in target center. The range of minimum and macimum doses in the target volume were 99.2∼100.0cGy, 100.3∼100.9cGy, respectively, %non-uniformity was below -3.40×10 -3%, and local efficiency was above 0.012, in all the treatment plans. Therefore, we though of conventional seven treatment plans as suitable radiotherapy plan in pituitary tumors. However, the integral doses to the patient was 3300cGy·g in the case of parallel-opposed open fiends technique which was the smallest dose in the seven treatment plans, but the doses to temporal lobe were nearly equal to the central tumor doses. Of the four 3-fields technique, the integral doses were 3670cGy·g in the plan with anterior open and parallel-opposed 45˚ wedge field technique and the frontal and temporal lobe were relatively small compared with the tumor doses. In the cases of 270˚ arc and 360˚ rotation therapy, the doses to frontal and temporal lobe could be reduced but normal tissues surrounding in tumor taken by about same tumor dose.

계장 캡슐의 고속중성자 조사량 평가

우홍 경산대학교 기초과학연구소 2001 基礎科學 Vol.5 No.2

조사시편이 받은 고속중성자 조사량을 평가하기 위하여 방사화 wire를 사용한 중성자 모니터를 제작하고 캡슐을 이용하여 조사시험하였다. 방사화 반응율은 γ-분광 분석으로 측정하였으며 wire에 의한 자체흡수를 보정하였다. 측정된 조사시편의 고속중성자 조사량을 MCNP 4A로 계산한 값과 비교하면 8.75±3.23∼38.5±9.42%로 캡슐의 하단에서 상단으로 갈수록 크게 나타났다. 조사공에 있어서 조사시편이 받은 고속중성자 기울기는 0.7%∼4.8%/cm로 하나로 노심 중앙 부분에 위치한 시편이 고른 중성자 조사를 받은 반면에 노심의 상하에 위치한 시편은 그 편차가 심한 것으로 나타났다. The neutron monitor made by activation wire for the evaluating fast neutron fluence in the irradiation test materials and irradiated using the instrumented capsule. The reaction rate corrected by self-absorption are measured by γ -spectroscopy. The measured neutron fluence compared with MCNP 4A calculation values are 8.75± 3.23∼38.5 ± 9.42% which are increased toward the top of a instrumented capsule. The sloop of neutron fluence of the irradiation test materials were 0.7% ∼4.8%/cm in central axis of irradiation hole. It showed that the deviation of HANARO core of the central plane were about the same, however, the deviation of the top or the bottom plane were larger than that of the central plane.

TLD 방사선 센서용 판독장치의 제작

우홍,강희동,최희동,이상윤,도시홍,김도성 경북대학교 센서기술연구소 1992 센서技術學術大會論文集 Vol.3 No.1

LiF:Mg, Cu, P-PTFE 열형광선량계의 제작과 특성조사

우홍 慶山大學校 1993 論文集 Vol.11 No.1

The LiF:Mg, Cu, P TL phosphors and LiF:Mg, Cu, P-PFTE TLD are fabricated. We are investigated their physical and dosimetric properties. The highly sensitive LiF:Mg, Cu, P TL phosphors are obtained when the contents of Mg, Cu, P in LiF are 0.8mol%, 0.05mo1%, and 2.5mol%, respectively and the phosphors are sintered in nitrogen environment at 800℃ for 30 minutes and then rapidly cool down. The optimum content and thickness of LiF:Mg, Cu, P TLDs are 20wt% and 176.2㎎/㎠, respectively. The duration time of polymerization are 5 minutes at 490℃ in air. The linear range of dose response in these TLDs to γ-rays is 1mGy∼ 10Gy and the fading rate less than 1% for 6 months.

BaSO4 : Eu-PTFE TLD 방사선 센서의 제작과 물리적 특성

우홍,김성환,이상윤,강희동,김도성 ( Hong U,S . H . Kim,S . Y . Lee,H . D . Kang,D . S . Kim ) 한국센서학회 1992 센서학회지 Vol.1 No.1

This paper describes a new process technique for batch process of SOI(Si-on-Insulator) structures with buried cavities for MEMS(Micro Electro Mechanical System) applications by SDB(Si-wafer Direct Bonding) technology and electrochemical etch-stop. A low-cast electrochemical etch-stop method is used to control accurately the thikness of SOI. The cavities were made on the upper handling wafer by Si anisotropic etching. Two wafers are with an intermediate insulating oxide layer. After high-temperature annealing(1000℃, 60 min.), the SDB SOI structure with buried cavities was thinned by electrochemical etch-stop. The surface of the fabricated SDB SOI structure have more roughness that of lapping and polishing by mechanical method. This SDB SOI structure with buried cavities will provide a powerful and versatile substrate for novel microsensors and microactuators.

$BaSO_{4}$ : Eu-PTFE TLD 방사선 센서의 제작과 물리적 특성

우홍,김성환,이상윤,강희동,김도성,U, Hong,Kim, S.H.,Lee, S.Y.,Kang, H.D.,Kim, D.S. 한국센서학회 1992 센서학회지 Vol.29 No.3

$BaSO_{4}$ : Eu 열형광체 분말을 제작하고 이를 PTFE로 중합한 디스크형의 $BaSO_{4}$ : Eu-PTFE 고감도 TLD 방사선 센서를 제작하였다. $BaSO_{4}$ : Eu 열형광체는 $BaSO_{4}$분말과 활성체인 Eu($Eu_{2}O_{3}$) 및 두가지 용제 $NH_{4}Cl$과 $(NH_{4})_{2}SO_{4}$를 각각 lmol%, 6mol% 및 5mol%의 농도로 묽은 황산에 공침하여 건조시킨 후 질소분위기에서 $1000^{\circ}C$로 1시간 동안 소결하여 제작하였을 때 $X/{\gamma}$선에 대해 최대감도를 나타내었다. 그리고 $BaSO_{4}$ : Eu glow 곡선의 주 피이크의 활성화에너지와 진동수인자 및 발광차수는 각각 1.17eV, $3.6{\times}10^{11}/sec$ 및 1.25이었으며, 발광 스펙트럼의 피이크 파장은 425nm였다. 한편 $BaSO_{4}$ : Eu-PTFE TLD의 최적제작조건은 열형광체 분말의 함량은 40wt%, TLD의 두께는 $105.7mg/cm^{2}$ 중합조건은 $380^{\circ}C$, 공기중에서 2시간으로 결정하였다. 그리고 ${\gamma}$선에 대한 TL 피이크 강도의 선량의존성은 0.01-20Gy영역에서 선형적이었으며, 감쇠율은 60시간에 약 10 %였다. To develop the highly sensitive TLD radiation sensors, $BaSO_{4}$ : Eu-PTFE TLDs are fabricated by polymerizing the PTFE(polytetrafluoroethylene) with $BaSO_{4}$ : Eu TL phosphors. The $BaSO_{4}$ : Eu TL phosphors having the highest sensitivity of $X/{\gamma}$-rays are obtained by sintering at $1000^{\circ}C$ in $N_{2}$ atmosphere a mixture of $BaSO_{4}$ powder with 1mol% Eu($Eu_{2}O_{3}$), 6mol% $NH_{4}Cl$ and 5mol% $(NH_{4})_{2}SO_{4}$ which were co-precipitated in dilute sulfuric acid and then dried. The activation energy, frequency factor and kinetic order of $BaSO_{4}$ : Eu TL phosphor are 1.17eV, $3.6{\times}10^{11}/sec$ and 1.25, respectively. And the spectral peak of $BaSO_{4}$ : Eu is about 425nm. The optimum TL Phosphor content and thickness of the $BaSO_{4}$ : Eu-PTFE TLD are 40wt% and $105.7mg/cm^{2}$. The optimum polymerization temperature and time for fabrication of $BaSO_{4}$ : Eu-PTFE TLDs are $380^{\circ}C$ and 2 hours in air, respectively. The linear dose range to ${\gamma}$ rays is 0.01-20Gy and fading rate is about 10%/60hours.

중준위 조사선량율 측정용 전리함의 설계 및 특성

우홍,김성환,강희동,Woo, Hong,Kim, Sung-Hwan,Kang, Hee-Dong 한국의학물리학회 1996 의학물리 Vol.7 No.2

조사선량율 5mR/h 이상에서 동작하는 원통형 전리함을 설계ㆍ제작하고 상용의 전류계를 이용하여 전하수집 특성을 조사하였다. 전리함은 전체 길이 15.5cm, 직경 5.22cm인 원통형이고 활성체적은 190.4㎤이다. 전리함의 전극은 벽면, 중심축 및 보호전극으로 구성하고, 이들을 동심축상에 배치하여 바탕전류가 8.39$\times$$10^{-14}$ $\pm$1.5$\times$$10^{-15}$ A이 되게 하였다. 전리함에 인가된 전입이 400V일 때 Cs$^{137}$에 대하여 99.7%의 수집효율을 보였으며, 상용의 선량계와 비교한 결과 교정정수 4.531$\times$19$^{7}$ R/C를 구하였다. 에너지 응답특성은 Cs$^{137}$ 을 1로 하였을 때 Am$^{241}$과 Co$^{60}$ 는 각각 1.30, 1.05로 나타났다. 방사선이 전리함의 측면으로 입사할 경우 입사방향에 따른 응답특성의 차이는 무시할 수 있었다. We had designed and made the cylindrical ionization chamber which operated above 5 mR/h. Using commercial electrometer, we investigated the characterictic of charge collection in the ion chamber. The active volume was 190.4㎤ and overall length and diameter in the chamber was 15.5cm, 5.22cm, respectively. The chamber had three electrodes(inner, central, wall electrode). And background current was 8.39${\times}$10$\^$-14/${\pm}$1.5${\times}$10$\^$-15/A to arrange the electrodes which were coaxial in chamber axis. The collection efficiency of chamber for Cs$\^$137/ was 99.7% when the opreating voltage was applied 400V. Comparing with the commertial dosimetry system, the exposure calibration constant was 4.531${\times}$19$\^$7/R/C. By normalizing to CS$\_$137/ the relative energy response of the chamber was 1.30 for Am$\_$24/, 1.05 for C0$\_$60/, respectively. When the irrarition tranversed to the chamber axis, the isotropic effect of the chamber was not considerable.

MSGC의 Microstrip 기판의 설계 및 제작

우 홍 慶山大學校 基礎科學硏究所 1997 基礎科學 Vol.1 No.1

MSGC(microstrip gas chamber)에서 핵심기술인 microstrip 기판을 설계하고 제작하여 기본 특성을 조사하였다. Microstrip 기판은 기본적으로 MIS(metal insulator semicinductor) 구조를 갖고 있다. 크롬을 RF-sputtering하여 금속층을 만들었으며 금속층에 photo-lithography로 microstip을 형성하였다. 시차효과(parallax effect)를 줄이기 위하여 모든 microstrip의 방향이 X-선관의 초점을 향하도록 배열하였다. 절연층표면에 보론(5×10?? ion/㎠)을 이온주입하여 표면전하집적을 줄였다. Microstrip면을 SEM으로 분석한 결과 전극의 표면은 고른 반면 etch pitch가 평균 약 0.7㎛로 나타났다 We had designed microstrip substrate which was important technology in MSGC and investigated the properties of it. The microstrip substrate had a structure of MIS fundmantally. The microstrip was made on the metal layer which was sputtered by RF using chromium on insulator layer. The arrangement of microstrip was focused at target center of x-ray tube in order to reduce the parallax effect. For preventing the surface charge accumulation we implanted in the boron ions(5×10?? ion/㎠) in the surface of insulator layer. Resulting from SEM measurements, microstrip surface was clean and the etch pitch of it was 0.7㎛ on the average.

제1족지 연부조직 복합 이식을 이용한 조갑재건술

이종문,우홍서,김우경 大韓成形外科學會 1996 Archives of Plastic Surgery Vol.23 No.4

Nail injuries are one of the most common injuries of the hand. Complete loss or posttraumatic deformity of the nail causes cosmetic as well as functional problems. Many reconstructive procedures including prosthesis, split thickness nailbed graft, vascularized free toe nail flap have been introduced, but there were few acceptable methods in case of partial loss of nailbed and pulp or hooknail deformity. In case of partial loss of nailbed and pulp, we used composite graft (nailbed and pulp) form great toe. The hooknail deformity is a complication of finger tip amputation. If there is loss of support of the distal nailbed over the distal phalanx, the nailbed may curve volarly. The nail will continue to curve after leaving the nailbed and can result in a tight, painful tip with inadequate padding as well as the cosmetically unpleasant clawlike nail. To correct the deformity, it is necessary to release the distal nailbed completely, return it to the normal position, and provide adequate support to maintain correction of the volarly deformed nail. In cases of hooknail deformity, we used composite graft(pulp) from great toe after elevation of nailbed-periosteal flap. This method had some advantages in these aspects (1) it can be performed under local anesthesia. (2) simple and one stage operation (3) minimal donor site morbidity (4) donor is identical to finger tip. In summary, composite graft technique could successfully performed in specific situations such as partial loss of nailbed and pulp or hooknail deformity.

음경연장 및 확대성형술

안덕선,구상환,우홍서 大韓成形外科學會 1996 Archives of Plastic Surgery Vol.23 No.5

Although many patients with micorpenis prefer to have augmentation phalloplasty, there are few reports on augmentation phalloplasty. Lengthening of micropenis can be achieved by partial separation of penile crura from pubo-ischial rami with division of suspensory ligament. Augmentation of width of penis can be achieved by autogenous dermofat graft. 23 patients with congenital micropenis and one patient with acquried micropenis due to dog bite were treated with above methods. The sensation and erect function of penis were remained quite normal. The procedure was safe and effective without any complications.