http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
이성광(Sung-Gwang Lee),박한준(Han June Park),이인재(Injae Lee),남예빈(Yebin Nam),황원태(Wontae Hwang) 대한기계학회 2021 대한기계학회 춘추학술대회 Vol.2021 No.11
As the critical dimension of semiconductors is miniaturized, the semiconductor fabrication process requires extreme purity and cleanliness, and many semiconductor facilities perform the process after creating a vacuum environment. Precursor gases used during the process make patterns by repeating deposition and etching through wafer surface reaction. In order to increase the production yield of circular wafers, it is essential to predict the behavior of process gases in a vacuum environment. Although computational fluid dynamics (CFD) is being performed to predict the airflow, there are very few studies that visualize and analyze the airflow through an experiment in a vacuum environment due to the difficulty of measuring the airflow. Therefore, there is a limit to verifying the CFD results. This study visualizes a supersonic round jet airflow in a vacuum environment in a 2D plane where the absolute pressure is lowered to 1 Torr. Using PIV, the structure of the jet, turbulent kinetic energy (TKE), and vorticity are analyzed by measuring the flow velocity of the jet. In addition, the location, size, and structure of the shockwave were analyzed using shadowgraphy. Through this study, we intend to provide an experimental basis for visualization of airflow in a vacuum environment.