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RISS 인기검색어
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- 저자 : 강성철(Seong Chul Kang) (검색결과 4 건)
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정규 저크(Normalized Jerk)를 이용한 태권도 돌려차기 동작 분석
조임형(Lim Hyeong Cho),강성철(Seong Chul Kang),강신배(Sin Bae Kang),박석(Sok Park),김태완(Tae Wan Kim),고석곤(Suk Gon Go),권문석(Moon Seok Kwon) 한국사회체육학회 2012 한국사회체육학회지 Vol.0 No.49
The purpose of this study was to evaluate the round-house kick of Teakwondo and to compare between elite and novice Teakwondo players using the normalized jerk method. MATLAB v6.5(Mathworks Inc., USA) was employed to analyze the normalized jerk. Fourteen male subjects who had no musculo-skeletal diseases were participated and were classified into two groups(7 elite and 7 non-elite Teakwondo players). While all subjects performed the round-house kick, the height of target set up based on the center of trunk position, respectively. In this study, independent t-test (elite and non-elite) was applied to obtain the differences of normalized jerk value between the two groups. Significance level was set as p=.05. The forward backward and upward downward normalized jerk values of the kicking foot COM(center of mass) were found to be significantly different between elite and non-elite groups in the maximum knee flexion phase. Significant difference was seen in the upward downward normalized jerk value of the kicking foot COM from maximum knee flexion to impact between elite and non-elite groups(p<.05). The forward backward and upward downward normalized jerk values of the kicking foot COM were found to be significantly different between elite and non-elite groups during overall round-house kicking phase(p<.05). The left-side right-side and upward downward normalized jerk values of the whole body COM(center of mass) were found to be significantly different between elite and nonelite groups in the maximum knee flexion phase(p<.05). Significant difference was seen in the left-side right-side normalized jerk value of the kicking whole body COM from maximum knee flexion to impact between elite and non-elite groups(p<.05). The normalized jerk values of upward downward were found to be significantly different between elite and non-elite groups during overall round-house kicking phase(p<.05).
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반도체 제조 공정에서 실리콘 표면에 유입된 Stress의 마이크로 Raman 분광분석
손민영,정재경,박진성,강성철,Son, Min Young,Jung, Jae Kyung,Park, Jin Seong,Kang, Sung Chul 한국분석과학회 1992 분석과학 Vol.5 No.4
본 논문은 마이크로 Raman 분광분석법을 이용하여 국부적 열산화 후 실리콘 표면에 유입되는 스트레스를 평가한 것이다. 국부적 열산화 후 실리콘 표면에 유입되는 스트레스는 실리콘 산화막과 active 영역의 경계 부분에서 최대치를 나타내었다. Active 영역의 크기가 작아질수록 스트레스량은 증가하며, 이는 스트레스가 active 영역의 크기에 의존함을 보여 주는 것이다. 또한, active 영역이 $0.45{\mu}m$인 세 가지 소자 분리 공정, A, B, moB를 평가한 결과 moB 공정의 스트레스 값이 가장 작았으며, 새부리 효과도 가장 작았다. Using micro-Raman spectrometer, we investigated the evaluation of microstress on silicon surface after the local thermal oxidation. The induced stress of silicon surface after local thermal oxidation shows maximum value at the interface of silicon oxide and active area. The smaller the size of active area, the larger stress. From the evaluation of three other device isolation processes, A, B and moB, whose active size has $0.45{\mu}m$ in length, moB process is turned out to have the lowest stress value and the smallest bird's beak effect.
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Cytochrome c oxidase subunit 1과 RAPD 분석에 의한 한국 전복속의 계통 연구
서용배(Yong Bae Seo),강성철(Sung Chul Kang),최성석(Seong Seok Choi),이종규(Jong Kyu Lee),정태혁(Tae Hyug Jeong),임한규(Han Kyu Lim),김군도(Gun-Do Kim) 한국생명과학회 2016 생명과학회지 Vol.26 No.4
전복은 전복속(Haliotis)에 속하며 전 세계적으로 식품산업에서 중요한 복족류 연체동물이다. 우리나라에는 6개종; 북방전복(Haliotis discus hannai), 둥근전복(Haliotis discus discus), 왕전복(Haliotis madaka), 말전복(Haliotis gigantea), 오분자기(Haliotis diversicolor diversicolor), 마대오분자기(Haliotis diversicolor supertexta)가 보고되어 있다. 이 연구에서는 우리나라 해역에 서식하는 중 · 대형 전복과 4종인 북방전복, 둥근전복, 왕전복, 말전복의 유전학적 유연관계를 분석하기 위하여 미토콘드리아의 cytochrome c oxidase subunit I (COI) 유전자와 Random Amplified Polymorphic DNA (RAPD) 분석법을 실시 하였다. 본 연구의 결과 COI 유전자 분석과 RAPD 분석을 활용하면 4종의 전복 중 북방전복, 둥근전복, 왕전복을 한 그룹으로 나머지 한 그룹을 말전복으로 구분하는 종 분류는 명확히 구분할 수 있었다. 이러한 결과는 전복 교잡육종을 이용한 수출용 전복 신종자 개발에 있어 주요 대상종인 전복과 4종에 대한 유전적 근연 관계를 규정함으로써 향후 교잡육종 연구의 기초 자료를 제공할 수 있을 것으로 사료된다. Abalones are gastropod mollusks belonging to the genus Haliotis. Pacific abalones are regarded as a very important marine gastropod mollusk in Korea, Japan, China, and also in food industries around the world. In Korea, 6 species of abalone have been reported to occur along the coasts: Haliotis discus hannai, Haliotis discus discus, Haliotis madaka, Haliotis gigantea, Haliotis diversicolor supertexta, and Haliotis diversicolor diversicolor. This study was performed to discriminate the genetic variances by the partial sequences of the mitochondrial cytochrome c oxidase subunit I (COI) genes and random amplified polymorphic DNA (RAPD) analysis against four species of Pacific abalone (H. discus hannai, H. discus, H. madaka, H. gigantea). COI gene is reasonably well conserved and has been sequenced in various invertebrate taxa. The RAPD analysis technique is a relatively simple and low cost method that allows differentiation of taxa without the need to know their genomes. In this study, we investigated the genetic diversity, phylogenetic relationships within each species. The COI and RAPD analysis were able to distinguish between H. gigantea and the other three species. However, these analysis methods were inadequate to distinguish between H. discus and H. madaka. These results are believed to be able to provide a basis data for future hybrid breeding research by defining the genetically closely related four species of abalone, which is to develop new hybrid abalone for export using hybrid breeding.
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김영남(Young-Nam Kim),강성철(Sung-Chul Kang),박진성(Jin-Seong Park),이내인(Nae-In Lee),김일권(Il-Kwon Kim),김영욱(Young-Wug Kim) 한국진공학회(ASCT) 1993 Applied Science and Convergence Technology Vol.2 No.1
산화분위기에서의 Ti/SiO₂ 박막의 산화거동 및 계면반응을 조사했다. SiO₂막위에 100㎚의 티타니움을 스퍼터법으로 형성하여 급속가열로(Rapid Thermal Processor)에서 온도를 달리하여 산화시켰다. 산화거동은 박막의 면저항의 측정, 산화막 두께측정, XPS(X-ray Photoelectron Spectroscopy)에 의한 조성분석으로 평가했다. 산화시 티타니움 면저항은 표면에서 산화로 인해 약 500℃ 이상에서 증가하기 시작해서 800℃에서 포화되었다. 이 때 막두께는 약 700℃ 이상에서 약 2배로 증가한 후 일정한 두께를 나타내었다. 이 결과로부터 산화부산물에 도전성물질이 존재하는 것을 알 수 있었다. TEM과 XPS분석결과 400℃ 이상에서 산화시 Ti 표면에서부터 TiO₂가 형성되고 600℃이상에서는 TiO₂와 SiO₂의 계면에 TiO_x의 형성과 Si의 석출이 확인되었다. 석출되는 Si의 양은 온도에 따라 증가했다. The oxidation behavior of the titanium film and the interface between titanium and underlying SiO₂ were investigated. The titanium film, 100 ㎚ thick, sputtered on the SiO₂ film was oxidized at different temperatures using rapid thermal processor (RTP). The oxidation behavior was evaluated by the contactless resistivity measurement and measuring the thickness of the oxidized film. X-ray photoelectron spectroscopy (XPS) was performed for composition analysis of samples. The sheet resistance of the oxidized Ti film increased with oxidation temperature above 500℃ and saturated at 800℃. The oxidized film thickness also increased with temperature, and become about 2 times of orignal thickness of the Ti film above 700℃. This might indicate that conducting oxide film (TiO_x) was formed during oxidation. According to TEM observation and XPS analysis, the Ti film was oxidized above 400℃ from its surface. When it was oxidized above 600℃, the formation of TiO_x and the precipitation of Si occurred at the interface between TiO₂ and SiO₂. The amount of the precipitated Si increased with temperature.
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