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Fabrication of UV imprint stamp using diamond-like carbon coating technology
EUNG-SUG LEE(이응숙),JUN-HO JEONG(정준호),KI-DON KIM(김기돈),YOUNG-SUK SIM(심영석),DAE-GEUN CHOI(최대근),JUNHYUK CHOI(최준혁),TAE-WOO LIM(임태우),SANG-HU PARK(박상후),DONG-YOL YANG(양동열),NAM-GOO CHA(차남구),IN-KWON KIM(김인권),JIN- 대한기계학회 2005 대한기계학회 춘추학술대회 Vol.2005 No.11
The two-dimensional (2D) and three-dimensional (3D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography (UV-NIL) were fabricated using two kinds of methods, which were a DLC coating process followed by the focused ion beam (FIB) lithography and the two-photon polymerization (TPP) patterning followed by nano-scale thick DLC coating. We fabricated 70 ㎚ deep lines with a width of 100 ㎚ and 70 ㎚ deep lines with a width of 150 ㎚ on 100 ㎚ thick DLC layers coated on quartz substrates using the FIB lithography. 200 ㎚ wide lines, 3D rings with a diameter of 1.35 ㎛ and a height of 1.97 ㎛, and a 3D cone with a bottom diameter of 2.88 ㎛ and a height of 1.97 ㎛ were successfully fabricated using the TPP patterning and DLC coating process. The wafers were successfully printed on an UV-NIL using the DLC stamp. We could see the excellent correlation between the dimensions of features of stamp and the corresponding imprinted features.
김정환,이응숙,황경현,유영은,윤재성,Kim, Jeong Hwan,Lee, Eung-Sug,Whang, Kyung-Hyun,Yoo, Yeong-Eun,Yoon, Jae-Sung 대한기계학회 2015 대한기계학회 논문집. Transactions of the KSME. C, 산업기술과 혁신 Vol.3 No.4
이온 및 분자 이송제어를 위한 기능성 나노채널의 구현을 통하여 이온/분자의 상대적 크기에 의존하는 기존 분리 및 이송 기술의 선택효율, 투과도, 에너지 소비 측면에서의 기존 분리 기술의 한계를 극복하기 위한 새로운 개념의 분리 기술을 제시 하고자 하였다. 이를 위해 나노채널 플랫폼 가공 기술 개발, 나노채널 표면 기능화 기술 개발 등의 연구를 수행하였으며, 나노채널에 대한 전압인가 및 유량 조절이 가능한 이온이송제어 측정 시스템을 제작하고, 다층 금속 멤브레인을 이용하여 선택적으로 특정 이온($Cl^-$)의 이송을 95% 이상 차단하였다. 본 연구를 통하여 세포막에 존재하며 물분자만을 매우 효율적으로 투과시키는 채널인 아쿠아포린의 기능 및 특성을 모방한 신개념의 분리기술 구현을 위한 기반 기술 개발을 수행하였으며, 향후 지속적인 연구를 통하여 차세대 정수/담수, 휴대형 인공신장, 인공 감각 기관 등의 핵심 기반 기술이 될 것으로 예상한다. Functional nanochannels were fabricated in order to control selective ion transportation with high permeability and low energy consumption. In this research, nanochannel platform fabrication process and surface functionalization process were developed. In addition, selective ion transportation and concentration measurement system was also set-up. By using fabricated multilayer metal membrane with electrical bias, 95% of ion ($Cl^-$) was blocked. This developed process is new-conceptional membrane fabrication technology and is expected to be applied to next-generation water purification/desalination, portable artifical kidney, and artificial sense organ.
기상 자기조립박막 법을 이용한 나노임프린트용 점착방지막 형성 및 특성평가
차남구,김규채,박진구,정준호,이응숙,윤능구,Cha, Nam-Goo,Kim, Kyu-Chae,Park, Jin-Goo,Jung, Jun-Ho,Lee, Eung-Sug,Yoon, Neung-Goo 한국재료학회 2007 한국재료학회지 Vol.17 No.1
Nanoimprint lithography (NIL) is a new lithographic method that offers a sub-10nm feature size, high throughput, and low cost. One of the most serious problems of NIL is the stiction between mold and resist. The antistiction layer coating is very effective to prevent this stiction and ensure the successful NIL results. In this paper, an antistiction layer was deposited by VSAM (vapor self assembly monolayer) method on silicon samples with FOTS (perfluoroctyltrichlorosilane) as a precursor for making an antistiction layer. A specially designed LPCVD (low pressure chemical vapor deposition) was used for this experiment. All experiments were achieved after removing the humidity. First, the evaporation test of FOTS was performed for checking the evaporation temperature at low pressure. FOTS was evaporated at 5 Tow and $110^{\circ}C$. In order to evaluate the temperature effect on antistiction layer, chamber temperature was changed from 50 to $170^{\circ}C$ with 0.1ml of FOTS for 1 minute. Good hydrophobicity of all samples was shown at about $110^{\circ}$ of contact angle and under $20^{\circ}$ of hysteresis. The surface energies of all samples calculated by Lewis acid/base theory was shown to be about 15mN/m. The deposited thicknesses of all samples measured by ellipsometry were almost 1nm that was similar value of the calculated molecular length. The surface roughness of all samples was not changed after deposition but the friction force showed relatively high values and deviations deposited at under $110^{\circ}$. Also the white circles were founded in LFM images under $110^{\circ}$. High friction forces were guessed based on this irregular deposition. The optimized VSAM process for FOTS was achieved at $170^{\circ}C$, 5 Torr for 1 hour. The hot embossing process with 4 inch Si mold was successfully achieved after VSAM deposition.