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COMPUTER-AIDED LASER INTERFEROMETER FOR TESTING THE FLATNESS OF SILICON WAFERS
Kotlyar, V. V.,Seraphimovich, P. G.,Soifer, V. A. 대한전자공학회 1992 HICEC:Harbin International Conference on Electroni Vol.1 No.1
An optical-electronic set-up of computer-aided shift interferometer for non-contact routine testing of flatness of polished silicon wafers with diameter 200㎜ has been described. The gas He-Ne laser with the wavelenght λ=0.631㎛ and power of 15mW and collimating lens with the diameter of 250㎜ and focal lenght of 1250㎜ was used. The phase binary diffraction grating is used as a splitter of a beam. The interferogram was registered as a array of 256×256×8 bits by TV-camera. The measurements of the deviation of a wafer flatness were performed in the 1-to 100㎛ band providing the accuracy up to 0.3㎛. Time of the frame processing was 1 minute when using IBM PC/AT-286 computer.
COMPUTATIONAL EXPERIMENT FOR FOCUSATORS INVESTIGATION
Doskolovich, L. L.,Golub, M. A.,Kazanskiy, N. L.,Soifer, V. A. 대한전자공학회 1992 HICEC:Harbin International Conference on Electroni Vol.1 No.1
Computer generated diffractive optical elements, known as $quot;focusators$quot;, provide for very complicated focal intensity distributions, depending on the number of pixels and quantization levels. The manufacturing of such elements is very expensive and must be preceded by computer simulation of their performance. Computer experiment with laser beam focusator into segments is described in this report, the estimations of power efficiency and focal line quality for various parameters of the phase digitization are obtained.