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마이크로 사이즈 인출구경을 이용한 고휘도 이온빔 인출 시스템 개발
김윤재,박동희,정형설,황용석 한국공작기계학회 2005 한국공작기계학회 춘계학술대회논문집 Vol.2005 No.-
In order to develop a high brightness ion source using plasma, the ion beam extraction system with an aperture of 100μm in diameter has been designed and constructed. It is observed that over 500nA of He ion beam current can be extracted. With such an optimized condition, ~10³ A/cm²sr beam brightness can be measured by emittance scanner, which is believed to be a promising result for developing next generation FIB.
국부 방전 효과를 이용한 고휘도 집속 이온빔용 유도결합 플라즈마 이온원의 개발
박용신(Yeong-Shin Park),김윤재(Yoon-Jae Kim),정형설(Hyeong-Seol Jeong),황용석(Yong-Seok Hwang) 한국생산제조학회 2006 한국공작기계학회 춘계학술대회논문집 Vol.2006 No.-
The research and development of Inductively coupled plasma source for high brightness focused ion beam have been performed in SNU. To get high beam brightness, It is essential to make smaller extraction aperture in plasma ion source Reducing aperture size to micrometer scale, however, decreases beam currents significantly since the extraction field cannot be penetrated into the plasma source and the concave meniscus cannot be made. In this article, a novel extraction method based on bias electrode is proposed and demonstrated by observing the existence of high current mode with 100㎛ aperture. Ion current with positively biased on bias electrode is increased suddenly by an order of magnitude from that of the non biased case. Localized electrons in the vicinity of the positively biased electrode are considered as the main cause of high current mode.