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최원호(Wonho Choi),신윤혁(Yoon hyuk Shin),강인구(Ingoo Kang),임홍재(Hong Jae Yim),장시열(Siyoul Jang),정재일(Jay Il Jeong),이기성(Kee Sung Lee),임시형(Si-Hyung Lim) 대한기계학회 2009 대한기계학회 춘추학술대회 Vol.2009 No.5
A UV Nano Imprint Lithography (UV-NIL) machine has been developed for micro/nanoscale patterning in an extremely large area like ~300×400 ㎟, To get high pattern fidelity, residual layer thickness uniformity, and an air bubble free layer in the large area, the UV-NIL machine has several main components including a silicon rubber uniform pressurizer, a large area UV-LED module, a vacuum pump, etc. Contact and structural analyses have been performed using commercial FEM packages like LS-DYNA and ANSYS. The developed machine has been tested and its performance indices such as pattern fidelity, residual layer thickness uniformity, etc have been measured.