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Structural characterization of Ga-doped Mg0 .1Zn0.9O layers grown on ZnO/α- Al2O3 templates by P-MBE
Z.Vashaei,C.Harada,A.Setiawan,M.W.Cho,T.Yao 한국물리학회 2004 Current Applied Physics Vol.4 No.6
In this study, structural properties of epitaxial Ga-doped Mg0:1Zn0:9O layers grown on ZnO/a-Al2O3 templates by plasma-assisted molecular beam epitaxy have been investigated by high-resolution transmission electron microscopy (HRTEM), and highresolution X-ray diraction (HRXRD). From analysis of the diraction pattern, the monocrystallinity of the Mg0:1Zn0:9O layerwith hexagonal structure is conrmed. The orientation relationship between Mg0:1Zn0:9O and the template is determined as(0001ÞMg 0:1Zn0:9Ok(0001)ZnOk(0001ÞAl2O3 and [2.1.10.Mg 0:1Zn0:9O k[2.1.10]ZnOk[1.100.Al2O3. The density of dislocations near the topsurface layers measured by plan-view TEM is about 3.61010 cm. 2, one order of magnitude higher than the value obtained for ZnOlayers ona-Al2O3 with a MgO buer. Cross-sectional observation revealed that the majority of threading dislocations are in the[001] line direction, i.e. they lie along the surface normal and consist of edge, screw, and mixed dislocations. Cross- sectional TEMand X-ray rocking curve experiments reveal that most of dislocations are edge dislocations. The interface of Mg0:1Zn0:9O and ZnOlayers and the eect of excess Ga-doping in these layers have been also studied.
T. Minegishi,Z. Vashaei,G. Fujimoto,H. Suzuki,K. Sumitani,M. Cho,M. Suemitsu,O. Sakata,S. Tokairin,T. Yao,Y. Narita 한국물리학회 2006 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.49 No.3
We studied ZnO growth on 3C-SiC(001)/Si(001) templates. In-situ reflection high- energy electron diffraction (RHEED) observations implied that ZnO grown on 3C-SiC(001) had a critical thickness (50 nm). From a structural characterization by using X-ray diffraction, we revealed that ZnO films thinner than the critical thickness grown on 3C-SiC(001) had a [10-11] orientation with 4-fold in-plane symmetry. On the other hand, ZnO films thicker than the critical thickness consisted of [10-11] and [0001] orientations. Also, the portion of [0001] oriented ZnO increased with the layer thickness. Possible interface configurations of ZnO(10-11)/3C-SiC(001) and ZnO(0001)/ZnO(10-11) are suggested.